Metal oxide and semiconductor device

ABSTRACT

A novel metal oxide is provided. The metal oxide has a plurality of energy gaps, and includes a first region having a high energy level of a conduction band minimum and a second region having an energy level of a conduction band minimum lower than that of the first region. The second region comprises more carriers than the first region. A difference between the energy level of the conduction band minimum of the first region and the energy level of the conduction band minimum of the second region is 0.2 eV or more. The energy gap of the first region is greater than or equal to 3.3 eV and less than or equal to 4.0 eV and the energy gap of the second region is greater than or equal to 2.2 eV and less than or equal to 2.9 eV.

TECHNICAL FIELD

One embodiment of the present invention relates to a metal oxide.

Note that one embodiment of the present invention is not limited to theabove technical field. The technical field of one embodiment of theinvention disclosed in this specification and the like relates to anobject, a method, or a manufacturing method. In addition, one embodimentof the present invention relates to a process, a machine, manufacture,or a composition of matter. In particular, one embodiment of the presentinvention relates to a metal oxide or a manufacturing method of themetal oxide. In addition, one embodiment of the present inventionrelates to a semiconductor device, a display device, a liquid crystaldisplay device, a light-emitting device, a power storage device, amemory device, a driving method thereof, or a manufacturing methodthereof.

In this specification and the like, a semiconductor device generallymeans a device that can function by utilizing semiconductorcharacteristics. A semiconductor element such as a transistor, asemiconductor circuit, an arithmetic device, and a memory device areeach an embodiment of a semiconductor device. An imaging device, adisplay device, a liquid crystal display device, a light-emittingdevice, an electro-optical device, a power generation device (includinga thin film solar cell, an organic thin film solar cell, and the like),and an electronic appliance may each include a semiconductor device.

BACKGROUND ART

As a semiconductor material applicable to a transistor, an oxide hasbeen attracting attention. For example, Patent Document 1 discloses afield-effect transistor including an amorphous oxide of any of anIn-Zn-Ga-O-based oxide, an In-Zn-Ga-Mg-O-based oxide, an In-Zn-O-basedoxide, an In-Sn-O-based oxide, an In-O-based oxide, an In-Ga-O-basedoxide, and a Sn-In-Zn-O-based oxide.

Non-Patent Document 1 discusses a structure in which an active layer ofa transistor includes two layers of metal oxides of an In-Zn-O-basedoxide and an In-Ga-Zn-O-based oxide.

REFERENCE Patent Document

-   [Patent Document 1] Japanese Patent No. 5118810

Non-Patent Document

-   [Non-Patent Document 1] John F. Wager, “Oxide TFTs: A Progress    Report”, Information Display 1/16, SID 2016, January/February 2016,    Vol. 32, No. 1, pp. 16-21

DISCLOSURE OF INVENTION

In Patent Document 1, an active layer of a transistor is formed using anamorphous oxide of any of an In-Zn-Ga-O-based oxide, anIn-Zn-Ga-Mg-O-based oxide, an In-Zn-O-based oxide, an In-Sn-O-basedoxide, an In-O-based oxide, an In-Ga-O-based oxide, and aSn-In-Zn-O-based oxide. In other words, the active layer of thetransistor includes one of the amorphous oxides. The transistor whoseactive layer includes one of the amorphous oxides has a problem of asmall on-state current, which is one of electrical characteristics ofthe transistor. Alternatively, the transistor whose active layerincludes one of the amorphous oxides has a problem of decreasedreliability.

In Non-Patent Document 1, a channel-protective bottom-gate transistorachieves high field-effect mobility (μ=62 cm²V⁻¹s⁻¹). An active layer ofthe transistor is a two-layer stack of an In—Zn oxide and an In—Ga—Znoxide, and the thickness of the In—Zn oxide where a channel is formed is10 nm. However, the S value (the subthreshold swing (SS)), which is oneof transistor characteristics, is as large as 0.41 V/decade. Moreover,the threshold voltage (Vth), which is also one of transistorcharacteristics, is −2.9 V, which means that the transistor has anormally-on characteristic.

In view of the above problems, an object of one embodiment of thepresent invention is to provide a novel metal oxide. Another object ofone embodiment of the present invention is to give favorable electricalcharacteristics to a semiconductor device. Another object of oneembodiment of the present invention is to provide a highly reliablesemiconductor device. Another object of one embodiment of the presentinvention is to provide a semiconductor device with a novel structure.Another object of one embodiment of the present invention is to providea display device with a novel structure.

Note that the descriptions of these objects do not disturb the existenceof other objects. In one embodiment of the present invention, there isno need to achieve all the objects. Other objects will be apparent fromand can be derived from the description of the specification, thedrawings, the claims, and the like.

One embodiment of the present invention is a metal oxide having aplurality of energy gaps. The metal oxide includes a first region havinga high energy level of a conduction band minimum and a second regionhaving an energy level of a conduction band minimum lower than that ofthe first region. The second region includes more carriers than thefirst region. A difference between the energy level of the conductionband minimum of the first region and the energy level of the conductionband minimum of the second region is greater than or equal to 0.2 eV. Anenergy gap of the first region is greater than or equal to 3.3 eV andless than or equal to 4.0 eV and an energy gap of the second region isgreater than or equal to 2.2 eV and less than or equal to 2.9 eV.

Another embodiment of the present invention is a metal oxide having aplurality of energy gaps. The metal oxide includes a first region havinga high energy level of a conduction band minimum and a second regionhaving an energy level of a conduction band minimum lower than that ofthe first region. The first region includes an M oxide (M is at leasttwo kinds of elements selected from Al, Ga, Si, Mg, Zr, Be, and B), an Mnitride, or an In—M—Zn oxide. The second region includes an In oxide oran In—Zn oxide.

Another embodiment of the present invention is a metal oxide including afirst region having a first energy gap and a second region having asecond energy gap. The first region has an energy level of a conductionband minimum higher than that of the second region. The first regioncomprises a first oxide of a first metal element. The second regioncomprises a second oxide of a second metal element. The first oxidecomprises a third element different from the first metal element toincrease an energy gap. When the second region includes the thirdelement, a concentration of the third element in the first region ishigher than a concentration of the third element in the second region.

In any of the above embodiments, the first metal element is Ga, thesecond metal element is In, and the third element is at least two kindsof elements selected from Al, Si, Mg, Zr, Be, and B.

In any of the above embodiments, the first region further includes Inand Zn, and the second region further includes Zn.

Another embodiment of the present invention is a semiconductor deviceincluding the above-described metal oxide, a gate electrode, a sourceelectrode, and a drain electrode.

According to one embodiment of the present invention, a novel metaloxide can be provided. According to one embodiment of the presentinvention, a semiconductor device with favorable electricalcharacteristics can be provided. A highly reliable semiconductor devicecan be provided. A semiconductor device with a novel structure can beprovided. A display device with a novel structure can be provided.

Note that the description of these effects does not preclude theexistence of other effects. One embodiment of the present invention doesnot necessarily achieve all the effects listed above. Other effects willbe apparent from and can be derived from the description of thespecification, the drawings, the claims, and the like.

BRIEF DESCRIPTION OF DRAWINGS

In the accompanying drawings:

FIG. 1 is a conceptual view illustrating a composition of a metal oxide;

FIG. 2A is a schematic view of a transistor and FIGS. 2B and 2C areschematic views illustrating distribution of energy levels in thetransistor;

FIGS. 3A to 3C each illustrate a model of a band diagram of atransistor;

FIGS. 4A to 4C each illustrate a model of a band diagram of atransistor;

FIGS. 5A to 5D are a top view, cross-sectional views, and across-sectional conceptual view illustrating one embodiment of asemiconductor device;

FIGS. 6A to 6D are a top view, cross-sectional views, and across-sectional conceptual view illustrating one embodiment of asemiconductor device;

FIGS. 7A to 7D are a top view, cross-sectional views, and across-sectional conceptual view illustrating one embodiment of asemiconductor device;

FIGS. 8A to 8D are a top view, cross-sectional views, and across-sectional conceptual view illustrating one embodiment of asemiconductor device;

FIGS. 9A to 9D are a top view, cross-sectional views, and across-sectional conceptual view illustrating one embodiment of asemiconductor device;

FIGS. 10A to 10D are a top view, cross-sectional views, and across-sectional conceptual view illustrating one embodiment of asemiconductor device;

FIGS. 11A to 11D are a top view, cross-sectional views, and across-sectional conceptual view illustrating one embodiment of asemiconductor device;

FIGS. 12A to 12D are a top view, cross-sectional views, and across-sectional conceptual view illustrating one embodiment of asemiconductor device;

FIGS. 13A to 13D are cross-sectional views illustrating an example of amanufacturing process of a semiconductor device;

FIGS. 14A to 14C are cross-sectional views illustrating an example of amanufacturing process of a semiconductor device;

FIGS. 15A to 15C are cross-sectional views illustrating an example of amanufacturing process of a semiconductor device;

FIGS. 16A and 16B each show a band structure;

FIG. 17 illustrates a structure example of a display panel; and

FIG. 18 illustrates a structure example of a display panel.

BEST MODE FOR CARRYING OUT THE INVENTION

Hereinafter, embodiments will be described with reference to drawings.However, the embodiments can be implemented with various modes. It willbe readily appreciated by those skilled in the art that modes anddetails can be changed in various ways without departing from the spiritand scope of the present invention. Thus, the present invention shouldnot be interpreted as being limited to the following description of theembodiments.

In the drawings, the size, the layer thickness, or the region isexaggerated for clarity in some cases. Therefore, the size, the layerthickness, or the region is not limited to the illustrated scale. Notethat the drawings are schematic views showing ideal examples, andembodiments of the present invention are not limited to shapes or valuesshown in the drawings.

Note that in this specification, ordinal numbers such as “first”,“second”, and “third” are used in order to avoid confusion amongcomponents, and the terms do not limit the components numerically.

In this specification, terms for describing arrangement, such as “over”,“above”, “under”, and “below”, are used for convenience in describing apositional relation between components with reference to drawings.Furthermore, the positional relation between components is changed asappropriate in accordance with a direction in which each component isdescribed. Thus, there is no limitation on terms used in thisspecification, and description can be made appropriately depending onthe situation.

In this specification and the like, a transistor is an element having atleast three terminals of a gate, a drain, and a source. The transistorhas a channel region between a drain (a drain terminal, a drain region,or a drain electrode) and a source (a source terminal, a source region,or a source electrode), and current can flow through the drain, thechannel region, and the source. Note that in this specification and thelike, a channel region refers to a region through which current mainlyflows.

Furthermore, functions of a source and a drain might be switched whentransistors having different polarities are employed or a direction ofcurrent flow is changed in circuit operation, for example. Therefore,the terms “source” and “drain” can be switched in this specification andthe like.

Note that in this specification and the like, the term “electricallyconnected” includes the case where components are connected through an“object having any electric function”. There is no particular limitationon the “object having any electric function” as long as electric signalscan be transmitted and received between components that are connectedthrough the object. Examples of an “object having any electric function”are a switching element such as a transistor, a resistor, an inductor, acapacitor, and an element with a variety of functions as well as anelectrode and a wiring.

In this specification and the like, a “silicon oxynitride film” refersto a film that includes oxygen at a higher proportion than nitrogen, anda “silicon nitride oxide film” refers to a film that includes nitrogenat a higher proportion than oxygen.

In the description of modes of the present invention in thisspecification and the like with reference to the drawings, the samecomponents in different drawings are commonly denoted by the samereference numeral in some cases.

In this specification and the like, the term “parallel” indicates thatthe angle formed between two straight lines is greater than or equal to−10° and less than or equal to 10°and accordingly also includes the casewhere the angle is greater than or equal to −5° and less than or equalto 5°. In addition, the term “substantially parallel” indicates that theangle formed between two straight lines is greater than or equal to −30°and less than or equal to 30°. In addition, the term “perpendicular”indicates that the angle formed between two straight lines is greaterthan or equal to 80° and less than or equal to 100°and accordingly alsoincludes the case where the angle is greater than or equal to 85° andless than or equal to 95°. In addition, the term “substantiallyperpendicular” indicates that the angle formed between two straightlines is greater than or equal to 60° and less than or equal to 120°.

In this specification and the like, the terms “film” and “layer” can beinterchanged with each other depending on the case. For example, theterm “conductive layer” can be changed into the term “conductive film”in some cases. Also, the term “insulating film” can be changed into theterm “insulating layer” in some cases.

Note that a “semiconductor” includes characteristics of an “insulator”in some cases when the conductivity is sufficiently low, for example.Furthermore, a “semiconductor” and an “insulator” cannot be strictlydistinguished from each other in some cases because a border between the“semiconductor” and the “insulator” is not clear. Accordingly, a“semiconductor” in this specification can be called an “insulator” insome cases. Similarly, an “insulator” in this specification can becalled a “semiconductor” in some cases.

In this specification and the like, a normally-on transistor is in anon-state even without application of potential by a power source (0 V).For example, in some cases, the normally-on characteristics mean thatthe threshold voltage of a transistor is negative when 0 V is applied toa gate of the transistor.

In this specification and the like, a metal oxide means an oxide ofmetal in a broad sense. Metal oxides are classified into an oxideinsulator, an oxide conductor (including a transparent oxide conductor),an oxide semiconductor (also simply referred to as an OS), and the like.For example, a metal oxide used in an active layer of a transistor iscalled an oxide semiconductor in some cases. In other words, a metaloxide having at least one of an amplification function, a rectificationfunction, and a switching function can be referred to as a metal oxidesemiconductor (abbreviated to an OS). That is, an OS FET is a transistorincluding a metal oxide or an oxide semiconductor.

In this specification and the like, a metal oxide including nitrogen isalso referred to as a metal oxide in some cases. Alternatively, a metaloxide including nitrogen may be referred to as a metal oxynitride.

Embodiment 1

In this embodiment, a metal oxide of one embodiment of the presentinvention is described.

The metal oxide of one embodiment of the present invention preferablyincludes at least In. In particular, In and Zn are preferably included.The metal oxide of one embodiment of the present invention can include,in addition to In and Zn, an element M (the element M is at least twokinds of elements selected from Al, Ga, Si, Mg, Zr, Be, and B). Inparticular, as the element M, at least two kinds of elements selectedfrom Al, Ga, and Si are preferably used. As the element M, a combinationof Al and Ga, a combination of Al and Si, or a combination of Ga and Siis preferably used.

For example, an In—Al—Ga—Zn oxide, an In—Al—Si—Zn oxide, and anIn—Ga—Si—Zn oxide are given as the metal oxide of one embodiment of thepresent invention.

The metal oxide of one embodiment of the present invention includes aplurality of components.

The metal oxide of one embodiment of the present invention includes afirst region and a second region. The first region includes an M oxide(M is at least two kinds of elements selected from Al, Ga, Si, Mg, Zr,Be, and B) and an In—M—Zn oxide. The second region includes an In oxideand/or an In—Zn oxide. In particular, the first region preferablyincludes a metal oxide having an energy level of a conduction bandminimum greater than that of the second region by at least 0.2 eV ormore at 1 atomic % to 50 atomic %.

When M is Al or Si, the M oxide may be replaced with an M nitride.Specifically, the M oxide may be replaced with aluminum nitride orsilicon nitride.

The metal oxide of one embodiment of the present invention includes aplurality of components, and thus has a plurality of energy gaps.Specifically, the metal oxide of one embodiment of the present inventionhas energy levels of conduction band minimums. Note that the term “aplurality of components” may be replaced with the term “a plurality ofregions”.

In this specification, the energy gap is a difference in energy betweenthe energy level of the valence band maximum (Ev edge) and the energylevel of the conduction band minimum (Ec edge) in the band structure.The energy gap can also be referred to as the band gap.

The metal oxide of one embodiment of the present invention includes afirst region having a high Ec edge and a second region having an Ec edgelower than that of the first region.

The second region includes more carriers than the first region. Thedifference between the Ec edge of the first region and the Ec edge ofthe second region is greater than or equal to 0.2 eV. The energy gap ofthe first region is greater than or equal to 3.3 eV and less than orequal to 4.0 eV and the energy gap of the second region is greater thanor equal to 2.2 eV and less than or equal to 2.9 eV.

A composition in which the metal oxide includes In, the element M, andZn is described with reference to FIG. 1.

<Composition of Metal Oxide>

FIG. 1 is a conceptual view of a metal oxide having a cloud-alignedcomposite (CAC) composition in one embodiment of the present invention.In this specification, a metal oxide of one embodiment of the presentinvention having a semiconductor function is defined as a cloud-alignedcomposite oxide semiconductor (CAC-OS).

The CAC-OS is referred to as a matrix composite or a metal matrixcomposite in some cases.

For example, in the CAC-OS, as illustrated in FIG. 1, elements includedin the metal oxide are unevenly distributed, and regions 001 mainlyincluding an element and regions 002 mainly including another elementare formed. The regions 001 and 002 are mixed to form a mosaic pattern.In other words, the CAC-OS has a composition in which elements includedin a metal oxide are unevenly distributed. Materials including unevenlydistributed elements each have a size of greater than or equal to 0.5 nmand less than or equal to 10 nm, preferably greater than or equal to 1nm and less than or equal to 2 nm, or a similar size. Note that in thefollowing description of a metal oxide, a state in which one or moreelements are unevenly distributed and regions including the element(s)are mixed is referred to as a mosaic pattern or a patch-like pattern.The regions each have a size of greater than or equal to 0.5 nm and lessthan or equal to 10 nm, preferably greater than or equal to 1 nm andless than or equal to 2 nm, or a similar size.

For example, an In-M-Zn oxide having the CAC composition has acomposition in which materials are separated into an In oxide (InO_(X1),where X1 is a real number greater than 0) or an In—Zn oxide(In_(X2)Zn_(Y2)O_(Z2), where X2, Y2, and Z2 are real numbers greaterthan 0), an In-M-Zn oxide (In_(W3)M_(X3)Zn_(Y3)O_(Z3), where W3, X3, Y3,and Z3 are real numbers greater than 0), an M oxide, and the like, and amosaic pattern is formed. Then, InO_(X1) or In_(X2)Zn_(Y2)O_(Z2),In_(W3)M_(X3)Zn_(Y3)O_(Z3), the M oxide, and the like forming the mosaicpattern are distributed in the film. Hereinafter, this composition isalso referred to as a cloud-like composition.

In other words, the metal oxide of one embodiment of the presentinvention includes at least two oxides or components selected from an Inoxide, an In—Zn oxide, an In-M oxide, an M oxide, an In-M-Zn oxide, andan M-Zn oxide.

In the case where the element M is Al and Ga, the metal oxide of oneembodiment of the present invention includes at least two oxidesselected from a Ga oxide, an In oxide, an In—Zn oxide, a Ga—Al oxide, anIn—Ga oxide, an In—Ga—Zn oxide, a Ga—Zn oxide, an Al oxide, an In—Aloxide, and an In—Al—Ga—Zn oxide. In particular, the metal oxide of oneembodiment of the present invention may be an In—Al—Zn oxide, anIn—Al—Ga—Zn oxide, or the like in which an oxide including Al, an oxideincluding Zn, and any of the above oxides are combined.

In the case where the element M is Si and Ga, the metal oxide of oneembodiment of the present invention includes at least two oxidesselected from a Ga oxide, an In oxide, an In—Zn oxide, a Ga—Si oxide, anIn—Ga oxide, an In—Ga—Zn oxide, a Ga—Zn oxide, a Si oxide, an In—Sioxide, and an In—Si—Ga—Zn oxide. In particular, the metal oxide of oneembodiment of the present invention may be an In—Si—Zn oxide, anIn—Si—Ga—Zn oxide, or the like in which an oxide including Si, an oxideincluding Zn, and any of the above oxides are combined.

That is, the metal oxide of one embodiment of the present invention canbe referred to as a composite material including a plurality ofmaterials or a plurality of components.

Here, let a concept in FIG. 1 illustrate an In-M-Zn oxide with the CACcomposition. In this case, it can be said that the region 001 is aregion including an oxide including the element M as a main componentand the region 002 is a region including InO_(X1) orIn_(X2)Zn_(Y2)O_(Z2) as a main component. Surrounding portions of theregion 001 and the region 002 are unclear (blurred), so that boundariesof the region 001 and the region 002 are not clearly observed in somecases.

In other words, an In-M-Zn oxide with the CAC composition is a metaloxide in which a region including an oxide including the element M as amain component and a region including InO_(X1) or In_(X2)Zn_(Y2)O_(Z2)as a main component are mixed. Accordingly, the metal oxide is referredto as a composite metal oxide in some cases.

In the In-M-Zn oxide with the CAC composition, crystal structures of theregion 001 and the region 002 are not particularly limited. The region001 and the region 002 may have different crystal structures.

For example, the In-M-Zn oxide having the CAC composition is preferablyan oxide semiconductor having a non-single crystal structure. Non-singlecrystal refers to an amorphous structure, a polycrystalline structure,and the like other than single crystal. Examples of a non-single-crystaloxide semiconductor include a CAAC-OS, a polycrystalline oxidesemiconductor, a nanocrystalline oxide semiconductor (nc-OS), anamorphous-like oxide semiconductor (a-like OS), and an amorphous oxidesemiconductor.

The CAAC-OS has a CAAC structure. An oxide semiconductor having a CAACstructure has c-axis alignment, its nanocrystals are connected in thea-b plane direction, and the crystal structure has distortion. Note thatthe distortion is a portion where the direction of a lattice arrangementchanges between a region with a regular lattice arrangement and anotherregion with a regular lattice arrangement in a region in whichnanocrystals are connected.

The shape of the nanocrystal is basically hexagon. However, the shape isnot always a regular hexagon and is a non-regular hexagon in some cases.A pentagonal lattice arrangement, a heptagonal lattice arrangement, andthe like are included in the distortion in some cases. Accordingly, inthe CAAC-OS, a grain boundary cannot be clearly observed also in thevicinity of the distortion. That is, formation of a grain boundary isinhibited due to the distortion of lattice arrangement. This is probablybecause the CAAC-OS can tolerate distortion owing to a low density ofthe atomic arrangement in the a-b plane direction, the interatomic bonddistance changed by substitution of a metal element, and the like.

In the nc-OS, a microscopic region (for example, a region with a sizegreater than or equal to 1 nm and less than or equal to 10 nm, inparticular, a region with a size greater than or equal to 1 nm and lessthan or equal to 3 nm) has a periodic atomic arrangement. There is noregularity of crystal orientation between different nanocrystals in thenc-OS. Thus, the orientation of the whole film is not observed.Accordingly, the nc-OS cannot be distinguished from an a-like OS or anamorphous oxide semiconductor, depending on an analysis method.

The a-like OS has a structure between those of the nc-OS and theamorphous oxide semiconductor. The a-like OS includes a void or alow-density region. That is, the a-like OS has an unstable structure,compared to the nc-OS and the CAAC-OS.

For example, the CAC-OS preferably has the CAAC structure. The CAACstructure is formed in a region including the region 001 or the region002 in some cases. That is, in the CAC-OS, a region to be the CAAC-OS isformed in a several-nanometer to several-tens of nanometer region.

The CAAC-OS is an oxide semiconductor with high crystallinity. Incontrast, in the CAAC-OS, a reduction in electron mobility due to thegrain boundary is less likely to occur because a clear grain boundarycannot be observed. Thus, with the CAAC-OS, a metal oxide is physicallystable; thus, a metal oxide which is resistant to heat and has highreliability can be provided.

The case where the metal oxide of one embodiment of the presentinvention is an In—Al—Ga—Zn oxide is described. Materials are separatedinto InO_(X1) or In_(X2)Zn_(Y2)O_(Z2), and In_(W3)Al_(X3)Zn_(Y3)O_(Z3)or In_(a)Al_(b)Ga_(c)Zn_(d)O_(e) (a, b, c, d, and e are real numbersgreater than 0), and a mosaic pattern is formed.

In other words, an In—Al—Ga—Zn oxide including a CAC-OS is a compositemetal oxide having a composition in which a region includingIn_(W3)Al_(X3)Zn_(Y3)O_(Z3) or In_(a)Al_(b)Ga_(c)Zn_(d)O_(e) as a maincomponent and a region including InO_(X1) or In_(X2)Zn_(Y2)O_(Z2) as amain component are mixed. Surrounding portions of the region includingIn_(W3)Al_(X3)Zn_(Y3)O_(Z3) or In_(a)Al_(b)Ga_(c)Zn_(d)O_(e) as a maincomponent and the region including InO_(X1) or In_(X2)Zn_(Y2)O_(Z2) as amain component are unclear (blurred), so that a boundary is not clearlyobserved in some cases.

For example, in the conceptual view in FIG. 1, the region 001corresponds to the region including In_(W3)Al_(X3)Zn_(Y3)O_(Z3) orIn_(a)Al_(b)Ga_(c)Zn_(d)O_(e) as a main component and the region 002corresponds to the region including InO_(X1) or In_(X2)Zn_(Y2)O_(Z2) asa main component. The region including In_(W3)Al_(X3)Zn_(Y3)O_(Z3) orIn_(a)Al_(b)Ga_(c)Zn_(d)O_(e) as a main component and the regionincluding InO_(X1) or In_(X2)Zn_(Y2)O_(Z2) as a main component may eachbe referred to as a nanoparticle. The diameter of the nanoparticle isgreater than or equal to 0.5 nm and less than or equal to 10 nm,typically greater than or equal to 1 nm and less than or equal to 2 nm.Surrounding portions of the nanoparticles are unclear (blurred), so thata boundary is not clearly observed in some cases.

The sizes of the region 001 and the region 002 can be measured withenergy dispersive X-ray spectroscopy (EDX) mapping images obtained byEDX. For example, the diameter of the region 001 is greater than orequal to 0.5 nm and less than or equal to 10 nm, or greater than orequal to 1 nm and less than or equal to 2 nm in the EDX mapping image ofa cross-sectional photograph in some cases. The density of an elementwhich is a main component is gradually lowered from the central portionof the region toward the surrounding portion. For example, when thenumber (abundance) of atoms of an element countable in an EDX mappingimage gradually changes from the central portion toward the surroundingportion, the surrounding portion of the region is unclear (blurred) inthe EDX mapping of the cross-sectional photograph. For example, from thecentral portion toward the surrounding portion in the region includingIn_(a)Al_(b)Ga_(c)Zn_(d)O_(e) as a main component, the number of Alatoms and Ga atoms gradually reduces and the numbers of In atoms and Znatoms gradually increase, so that the region includingIn_(X2)Zn_(Y2)O_(Z2) as a main component gradually appears. Accordingly,the surrounding portion of the region includingIn_(a)Al_(b)Ga_(c)Zn_(d)O_(e) as a main component is unclear (blurred)in the EDX mapping image.

A crystal structure of the In—Al—Ga—Zn oxide with the CAC composition isnot particularly limited. The region 001 and the region 002 may havedifferent crystal structures. For example, the In—Al—Ga—Zn oxide withthe CAC composition is preferably an oxide semiconductor having anon-single-crystal structure.

The crystallinity of the In—Al—Ga—Zn oxide including a CAC-OS can beanalyzed by electron diffraction. For example, in analysis of theIn—Al—Ga—Zn oxide by electron diffraction, a region with high luminancein a ring pattern and a plurality of spots in the region with highluminance in a ring pattern are observed in some cases in an electrondiffraction pattern image.

The conductivity of the region including InO_(X1) orIn_(X2)Zn_(Y2)O_(Z2) as a main component (the region 002 in FIG. 1) ishigher than that of the region including In_(W3)Al_(X3)Zn_(Y3)O_(Z3) orIn_(a)Al_(b)Ga_(c)Zn_(d)O_(e) as a main component (the region 001 inFIG. 1). In other words, when carriers flow through the regionsincluding InO_(X1) or In_(X2)Zn_(Y2)O_(Z2) as a main component, theconductivity of an oxide semiconductor is generated. Accordingly, whenthe regions including InO_(X1) or In_(X2)Zn_(Y2)O_(Z2) as a maincomponent are distributed in an oxide semiconductor like a cloud, highfield-effect mobility (μ) can be achieved. The region includingInO_(X1), In_(X2)Zn_(Y2)O_(Z2), or the like as a main component can besaid to be a semiconductor region whose properties are close to those ofa conductor.

In contrast, the conductivity of the region includingIn_(W3)Al_(X3)Zn_(Y3)O_(Z3) or In_(a)Al_(b)Ga_(c)Zn_(d)O_(e) as a maincomponent is lower than that of the region including InO_(X1) orIn_(X2)Zn_(Y2)O_(Z2) as a main component. In other words, when theregions including In_(W3)Al_(X3)Zn_(Y3)O_(Z3) orIn_(a)Al_(b)Ga_(c)Zn_(d)O_(e) as a main component are distributed in ametal oxide, leakage current can be suppressed and favorable switchingoperation can be achieved. The region includingIn_(W3)Al_(X3)Zn_(Y3)O_(Z3) or In_(a)Al_(b)Ga_(c)Zn_(d)O_(e) as a maincomponent can be said to be a semiconductor region whose properties areclose to those of an insulator. Furthermore, the conductivity ofIn_(a)Al_(b)Ga_(c)Zn_(d)O_(e) including an Al oxide and a Ga oxide ishigher than that of In_(W3)Al_(X3)Zn_(Y3)O_(Z3).

Accordingly, when the In—Al—Ga—Zn oxide including an CAC-OS is used fora semiconductor element, the property derived fromIn_(W3)Al_(X3)Zn_(Y3)O_(Z3) or In_(a)Al_(b)Ga_(c)Zn_(d)O_(e) and theproperty derived from InO_(X1) or In_(X2)Zn_(Y2)O_(Z2) complement eachother, whereby high on-state current (Ion), high field-effect mobility(4 and low off-state current (Ioff) can be achieved.

A semiconductor element including the In—Al—Ga—Zn oxide including anCAC-OS has high reliability. Thus, the In—Al—Ga—Zn oxide including anCAC-OS is suitably used in a variety of semiconductor devices typifiedby a display.

<Transistor Including Metal Oxide>

Next, the case where the metal oxide is used as a semiconductor in atransistor is described with reference to FIGS. 2A to 2C.

With the use of the metal oxide as a semiconductor in a transistor, thetransistor can have high field-effect mobility and high switchingcharacteristics. In addition, the transistor can have high reliability.

FIG. 2A is a schematic view of a transistor including the metal oxide ina channel region. The transistor in FIG. 2A includes a source, a drain,a first gate, a second gate, a first gate insulating portion, a secondgate insulating portion, and a channel portion. The resistance of achannel portion of a transistor can be controlled by application of apotential to a gate. That is, conduction (the on state of thetransistor) or non-conduction (the off state of the transistor) betweenthe source and the drain can be controlled by a potential applied to thefirst gate or the second gate.

The channel portion includes a CAC-OS in which the regions 001 having afirst energy gap and the regions 002 having a second energy gap aredistributed like a cloud. The first energy gap is larger than the secondenergy gap.

For example, the case where the In—Al—Ga—Zn oxide with the CACcomposition is used as the CAC-OS in the channel portion is described.The In—Al—Ga—Zn oxide with the CAC composition has a composition inwhich materials are separated into, as the region 001, a regionincluding In_(W3)Al_(X3)Zn_(Y3)O_(Z3) or In_(a)Al_(b)Ga_(c)Zn_(d)O_(e)as a main component and having higher Al or Ga concentration than theregion 002, and, as the region 002, a region including InO_(X1) orIn_(X2)Zn_(Y2)O_(Z2) as a main component and having higher Inconcentration than the region 001, and a mosaic pattern is formed. Then,In_(W3)Al_(X3)Zn_(Y3)O_(Z3) and/or In_(a)Al_(b)Ga_(c)Zn_(d)O_(e), andInO_(X1) and/or In_(X2)Zn_(Y2)O_(Z2) are distributed in the film. Thiscomposition is also referred to as a cloud-like composition. The region001 including In_(W3)Al_(X3)Zn_(Y3)O_(Z3) orIn_(a)Al_(b)Ga_(c)Zn_(d)O_(e) as a main component has an energy gapgreater than that of the region 002 including InO_(X1) orIn_(X2)Zn_(Y2)O_(Z2) as a main component. Furthermore, the energy gap ofIn_(a)Al_(b)Ga_(c)Zn_(d)O_(e) including an Al oxide and a Ga oxide isless than that of In_(W3)Al_(X3)Zn_(Y3)O_(Z3). The energy gap of theregion 001 is greater than or equal to 3.3 eV and less than or equal to4.0 eV and the energy gap of the region 002 is greater than or equal to2.2 eV and less than or equal to 2.9 eV.

A conduction model of the transistor illustrated in FIG. 2A is describedwith reference to FIG. 2B. FIG. 2B is a schematic view showingdistribution of energy levels between the source and the drain of thetransistor illustrated in FIG. 2A. FIG. 2C is a conduction band diagramon solid line X-X′ in the transistor illustrated in FIG. 2A. Note thatin each conduction band diagram, a solid line indicates the energy ofthe conduction band minimum. A dashed line Ef indicates the energy ofthe quasi-Fermi level of electrons. The case is assumed where a negativevoltage is applied between the gate and the source as a first gatevoltage and a drain voltage (V_(d)>0) is applied between the source andthe drain. In FIGS. 2A to 2C, the energy of the conduction band minimumis denoted by CB.

When a negative gate voltage is applied to the transistor illustrated inFIG. 2A, an energy of a conduction band minimum CB₀₀₁ derived from theregion 001 and an energy of a conduction band minimum CB₀₀₂ derived fromthe region 002 are formed between the source and the drain asillustrated in FIG. 2B. Since the first energy gap is larger than thesecond energy gap, the potential barrier of the energy of the conductionband minimum CB₀₀₁ is higher than the potential barrier of the energy ofthe conduction band minimum CB₀₀₂. That is, the maximum value of thepotential barrier in the channel portion is a value derived from theregion 001. Thus, the use of the CAC-OS in the channel portion in atransistor can suppress leakage current and achieve high switchingcharacteristics.

As illustrated in FIG. 2C, the energy gap of the region 001 having thefirst energy gap is relatively wider than the energy gap of the region002 having the second energy gap; thus, the Ec edge of the region 001having the first energy gap can exist at a relatively higher level thanthe Ec edge of the region 002 having the second energy gap.

Let the metal oxide of one embodiment of the present invention to be anIn—Al—Ga—Zn oxide.

In the In—Al—Ga—Zn oxide, the insulating property of the Al oxide ishigher than those of the In oxide, the In—Zn oxide, and the Ga oxide.That is, the Al oxide has a greater energy gap than the In oxide, theIn—Zn oxide, and the Ga oxide. In this manner, when the Al oxide havinga large energy gap is included, a difference between the Ec edge of theregion having a first energy gap and the Ec edge of the region having asecond energy gap can be made large. Thus, in the case where the metaloxide of one embodiment of the present invention is used in asemiconductor layer of a transistor, the field-effect mobility of thetransistor is improved and the oxygen vacancies are reduced, whereby ahighly reliable semiconductor device can be obtained.

Although Al is used in the above composition, Si, Mg, Zr, Be, or B maybe used instead of Al.

In the above composition, in some cases, a component of the region 001having the first energy gap is derived from the In—Al—Ga—Zn oxide or theIn—Al—Zn oxide, and a component of the region 002 having the secondenergy gap is derived from the In—Zn oxide or the In oxide. In thiscase, the first energy gap is greater than or equal to 3.3 eV and lessthan or equal to 4.0 eV and the second energy gap is greater than orequal to 2.2 eV and less than or equal to 2.9 eV. Values obtained bymeasurement of single films of respective materials with an ellipsometercan be used as the values of the energy gaps.

In the metal oxide of one embodiment of the present invention, thedifference between the energy level of the conduction band minimumderived from the region 001 and the energy level of the conduction bandminimum derived from the region 002 is preferably 0.2 eV or more. Sincethe position of the energy of the valence band maximum derived from theregion 001 having the first energy gap is different from the position ofthe energy of the valence band maximum derived from the region 002having the second energy gap in some cases, the difference between theenergy level of the conduction band minimum derived from the region 001and the energy level of the conduction band minimum derived from theregion 002 is preferably 0.3 eV or more, further preferably 0.4 eV ormore.

In the case of the above assumption, when carriers flow through theCAC-OS, the carriers flow owing to an In—Zn oxide or an In oxide whichhas the second energy gap, i.e., a small energy gap. At this time, thecarriers overflow the second energy gap into the first energy gap, i.e.,the In—Al—Ga—Zn oxide or the In—Al—Zn oxide side which has a largeenergy gap. In other words, carriers are easily generated in an In—Znoxide or an In oxide which has a small energy gap, and the carriers moveto an In—Al—Ga—Zn oxide or an In—Al—Zn oxide which has a large energygap.

The carrier density of the region having the first band gap, i.e., alarge energy gap, is higher than or equal to 1×10¹⁰ cm⁻³ and lower thanor equal to 1×10¹⁶ cm⁻³, preferably approximately 1×10¹⁵ cm⁻³. Thecarrier density of the region having the second band gap, i.e., a smallenergy gap, is preferably higher than or equal to 1×10¹⁸ cm³ and lowerthan 1×10²¹ cm³.

In the metal oxide where the channel portion is formed, the regions 001and the regions 002 form a mosaic pattern and are irregularly unevenlydistributed. For this reason, the conduction band diagram on solid lineX-X′ is merely an example.

Next, conduction band diagrams different from the conduction banddiagram in FIG. 2C are shown in FIGS. 3A to 3C. In FIGS. 3A to 3C, theenergy of the conduction band minimum is denoted by Ec.

In the metal oxide of one embodiment of the present invention, it isbasically acceptable as long as a band in which the region 002 isbetween the regions 001 is formed as shown in FIG. 3A. Alternatively, aband in which the region 001 is between the regions 002 is formed.

In a connection portion of the region 001 having the first energy gapand the region 002 having the second energy gap in the CAC-OS, anaggregation state and the composition of the regions become unstable insome cases. Accordingly, as illustrated in FIGS. 3B and 3C, the bandschange not discontinuously but continuously in some cases. In otherwords, the first energy gap and the second energy gap work together whencarriers flow through the CAC-OS.

FIGS. 4A to 4C are model diagrams of band diagrams on solid line X-X′ inthe transistor illustrated in FIG. 2A. When a voltage is applied to thefirst gate, the same voltage is applied to the second gate.

FIG. 4A shows a state (on state) in which, as a first gate voltageV_(g), a positive voltage (V_(g)>0) is applied between each of the gatesand the source. FIG. 4B shows a state in which the first gate voltageV_(g) is not applied (V_(g)=0). FIG. 4C shows a state (off state) inwhich, as the first gate voltage V_(g), a negative voltage (V_(g)<0) isapplied between each of the gates and the source. Note that in eachconduction band diagram, a solid line indicates the energy CB of theconduction band minimum. A dashed line Ef indicates the energy of thequasi-Fermi level of electrons.

In a transistor including the CAC-OS in a channel portion, the region001 having the first energy gap and the region 002 having the secondenergy gap electrically interact with each other. In other words, theregion 001 having the first energy gap and the region 002 having thesecond energy gap function complementarily.

As illustrated in FIG. 4A, when a potential at which the transistor isturned on (V_(g)>0) is applied to the first gate, electrons flow in theregion 002 having the second energy gap with the low energy of theconduction band minimum and serving as a main conduction path. At thesame time, electrons also flow in the region 001 having the first energygap. This enables high current drive capability in the on state of thetransistor, i.e., high on-state current and high field-effect mobility.

In contrast, as illustrated in FIGS. 4B and 4C, when a voltage lowerthan the threshold voltage (V_(g)≤0) is applied to the first gate, theregion 001 having the first energy gap serves as a dielectric(insulator), so that the conduction path in the region 001 is blocked.The region 002 having the second energy gap is in contact with theregion 001 having the first energy gap. Consequently, the region 001having the first energy gap electrically interact with each other andalso with the region 002 having the second energy gap, and thus, eventhe conduction path in the region 002 having the second energy gap isblocked. Accordingly, the whole channel portion is brought into anon-conductive state, and the transistor is turned off

As described above, with the use of the CAC-OS in a transistor, it ispossible to reduce or prevent leakage current between a gate and asource or a drain, which is generated when the transistor operates, forexample, when a potential difference is generated between the gate andthe source or the drain.

A metal oxide film with reduced hydrogen concentration is preferablyused in a transistor. The metal oxide film with reduced hydrogenconcentration may be referred to as a highly purified intrinsic orsubstantially highly purified intrinsic metal oxide. The highly purifiedintrinsic or substantially highly purified intrinsic metal oxide canhave a low carrier density because carriers due to hydrogen (e.g.,V_(o)H in which hydrogen is bonded to an oxygen vacancy) are few. Thehighly purified intrinsic or substantially highly purified intrinsicmetal oxide has a low density of defect states and accordingly has a lowdensity of trap states in some cases.

Charge trapped by the trap states in the metal oxide takes a long timeto be released and may behave like fixed charge. Thus, a transistorwhose channel region is formed in a metal oxide having a high density oftrap states has unstable electrical characteristics in some cases.

In order to obtain stable electrical characteristics of the transistor,it is effective to reduce the concentration of impurities in the metaloxide. In addition, in order to reduce the concentration of impuritiesin the metal oxide, the concentration of impurities in a film that isadjacent to the metal oxide is preferably reduced. Examples ofimpurities include hydrogen and alkali metal.

Here, the influence of impurities in the metal oxide will be described.

When carbon that is a Group 14 element is contained in the metal oxide,defect states are formed in the metal oxide. Thus, the concentration ofcarbon (measured by secondary ion mass spectrometry (SIMS)) is set to belower than or equal to 2×10¹⁸ atoms/cm³, preferably lower than or equalto 2×10¹⁷ atoms/cm³ in the metal oxide or around an interface with themetal oxide.

When the metal oxide contains alkali metal, defect states are formed andcarriers are generated, in some cases. Thus, a transistor including ametal oxide that contains alkali metal is likely to be normally on.Therefore, it is preferable to reduce the concentration of alkali metalin the metal oxide. Specifically, the concentration of alkali metal inthe metal oxide measured by SIMS is set to be lower than or equal to1×10¹⁸ atoms/cm³, preferably lower than or equal to 2×10¹⁶ atoms/cm³.

Hydrogen included in the metal oxide reacts with oxygen bonded to ametal atom to be water, and thus causes an oxygen vacancy (V_(o)) insome cases. Due to entry of hydrogen into the oxygen vacancy (V_(o)), anelectron serving as a carrier is generated in some cases. Furthermore,in some cases, bonding of part of hydrogen to oxygen bonded to a metalatom causes generation of an electron serving as a carrier. Thus, atransistor including the metal oxide that includes hydrogen is likely tobe normally on. Accordingly, hydrogen in the metal oxide is preferablyreduced as much as possible. Specifically, the hydrogen concentration ofthe metal oxide, which is measured by SIMS, is set to higher than orequal to 1×10¹⁶ atoms/cm³ and lower than 3×10²¹ atoms/cm³, preferablyhigher than or equal to 1×10¹⁷ atoms/cm³ and lower than 3×10²⁰atoms/cm³.

The oxygen vacancies (V_(o)) in the metal oxide can be reduced byintroduction of oxygen into the metal oxide. That is, the oxygenvacancies (V_(o)) in the metal oxide disappear when the oxygen vacancies(V_(o)) are filled with oxygen. Accordingly, diffusion of oxygen in themetal oxide can reduce the oxygen vacancies (V_(o)) in a transistor andimprove the reliability of the transistor.

As a method for introducing oxygen into the metal oxide, for example, anoxide in which oxygen content is higher than that in the stoichiometriccomposition is provided in contact with the metal oxide. That is, in theoxide, a region including oxygen in excess of that in the stoichiometriccomposition (hereinafter also referred to as an excess oxygen region) ispreferably formed. In particular, in the case of using a metal oxide ina transistor, an oxide including an excess oxygen region is provided ina base film, an interlayer film, or the like in the vicinity of thetransistor, whereby oxygen vacancies in the transistor are reduced, andthe reliability can be improved.

When a metal oxide with sufficiently reduced impurity concentration isused for a channel formation region in a transistor, the transistor canhave stable electrical characteristics.

<Method for Forming Metal Oxide>

An example of a method for forming the metal oxide is described below.

The metal oxide is preferably formed at a temperature higher than orequal to room temperature (e.g., 25° C.) and lower than or equal to 170°C., further preferably formed at a temperature higher than or equal to100° C. and lower than 150° C. For example, a large substrate like a10th-generation substrate has a substrate temperature limit inaccordance with its size. Accordingly, the substrate temperature is setas appropriate to a temperature which is higher than the evaporationtemperature of water (higher than or equal to 100° C.) and enablesfavorable maintainability and throughput of an apparatus. Note that theroom temperature includes a state where heating is not performedintentionally.

As a sputtering gas, a rare gas (typically argon), oxygen, or a mixedgas of a rare gas and oxygen is used as appropriate. When the mixed gasis used, the proportion of the oxygen gas in the whole deposition gas ishigher than or equal to 0% and lower than or equal to 30%, preferablyhigher than or equal to 5% and lower than or equal to 20%.

In addition, increasing the purity of a sputtering gas is necessary. Forexample, an oxygen gas or an argon gas used for a sputtering gas ishighly purified to have a dew point of −40° C. or lower, preferably −80°C. or lower, further preferably −100° C. or lower, still furtherpreferably −120° C. or lower, whereby entry of moisture or the like intothe metal oxide can be minimized.

In the case where the metal oxide is deposited by a sputtering method, achamber in a sputtering apparatus is preferably evacuated to a highvacuum (to the degree of approximately5×10⁻⁷ Pa to 1×10⁻⁴ Pa) with anadsorption vacuum pump such as a cryopump in order to remove water orthe like, which serves as an impurity for the metal oxide, as much aspossible. Alternatively, a turbo molecular pump and a cold trap arepreferably combined so as to prevent a backflow of a gas, especially agas containing carbon or hydrogen from an exhaust system to the insideof the chamber.

As a target, an In-M-Zn metal oxide target can be used. For example, ametal oxide target having an atomic ratio of In:Al:Ga:Zn=4:1:1:4,In:Al:Si:Zn=4:1:1:4, In:Ga:Si:Zn=4:1:1:4, In:Al:Ga:Zn=5:0.5:0.5:7,In:Al:Si:Zn=5:0.5:0.5:7, In:Ga:Si:Zn=5:0.5:0.5:7 or the vicinity thereofcan be preferably used.

In addition, in the sputtering apparatus, a magnet unit placed in thevicinity of the target may be rotated or moved. For example, the magnetunit is oscillated vertically or horizontally during the deposition,whereby the metal oxide of one embodiment of the present invention canbe formed. The magnet unit is oscillated with a beat of greater than orequal to 0.1 Hz and less than or equal to 1 kHz, for example.

The metal oxide of one embodiment of the present invention can beformed, for example, in the following manner: a mixed gas of oxygen anda rare gas in which the proportion of oxygen is approximately 10%; thesubstrate temperature is 130° C.; and the magnet unit placed in thevicinity of (e.g., on a rear surface of) an In—Al—Ga—Zn metal oxidetarget having an atomic ratio of In:Al:Ga:Zn=5:0.5:0.5:7.

Note that the structures described in this embodiment can be used inappropriate combination with any of the structures described in theother embodiments.

Embodiment 2

In this embodiment, semiconductor devices each including the metal oxideof one embodiment of the present invention, and manufacturing methodsthereof will be described with reference to FIGS. 5A to 5D, FIGS. 6A to6D, FIGS. 7A to 7D, FIGS. 8A to 8D, FIGS. 9A to 9D, FIGS. 10A to 10D,FIGS. 11A to 11D, FIGS. 12A to 12D, FIGS. 13A to 13D, FIGS. 14A to 14C,FIGS. 15A to 15C, and FIGS. 16A and 16B.

<2-1. Structure Example 1 of Semiconductor Device>

FIG. 5A is a top view of a transistor 100A that is a semiconductordevice of one embodiment of the present invention. FIG. 5B is across-sectional view taken along dashed-dotted line X1-X2 in FIG. 5A.FIG. 5C is a cross-sectional view taken along dashed-dotted line Y1-Y2in FIG. 5A. FIG. 5D is an enlarged cross-sectional conceptual view of aregion P1 illustrated in FIG. 5B.

Note that in FIG. 5A, some components of the transistor 100A (e.g., aninsulating film functioning as a gate insulating film) are notillustrated to avoid complexity. The direction of the dashed-dotted lineX1-X2 may be called a channel length direction, and the direction of thedashed-dotted line Y1-Y2 may be called a channel width direction. As inFIG. 5A, some components are not illustrated in some cases in top viewsof transistors described below.

The transistor 100A includes a conductive film 106 over a substrate 102,an insulating film 104 over the substrate 102 and the conductive film106, a metal oxide 108 over the insulating film 104, a conductive film112 a over the metal oxide 108, a conductive film 112 b over the metaloxide 108, an insulating film 114 over the metal oxide 108, theconductive film 112 a, and the conductive film 112 b, an insulating film116 over the insulating film 114, a conductive film 120 a over theinsulating film 116, and a conductive film 120 b over the insulatingfilm 116.

The insulating film 104 includes an opening 151, and a conductive film112 c, which is electrically connected to the conductive film 106through the opening 151, is formed over the insulating film 104. Theinsulating films 114 and 116 include an opening 152 a which reaches theconductive film 112 b and an opening 152 b which reaches the conductivefilm 112 c.

The metal oxide 108 includes the metal oxide of one embodiment of thepresent invention described in Embodiment 1. Here, a connection betweenthe metal oxide of one embodiment of the present invention and aconductive film is described with reference to FIG. 5D.

As illustrated in the region P1 in FIG. 5D, a top surface and a sidesurface of the metal oxide 108 are in contact with the conductive film112 a; thus, contact resistance can be reduced. In addition, the metaloxide 108 has the CAC composition in FIG. 1 and the region 002 includedin the CAC composition, i.e., a region with high conductivity is incontact with the conductive film 112 a; thus, the contact resistance canbe further reduced. Although not illustrated, a connection between themetal oxide 108 and the conductive film 112 b is similar to that in theregion P1.

The metal oxide of one embodiment of the present invention includes ahighly conductive region and the contact resistance between the metaloxide and the conductive film is reduced. Thus, the field-effectmobility of the transistor including the metal oxide can be increased.

Specifically, the field-effect mobility of the transistor 100A can behigher than 50 cm²/Vs, preferably higher than 100 cm²/Vs.

For example, the use of the transistor with high field-effect mobilityin a gate driver that is included in a display device and generates agate signal allows the display device to have a narrow frame. The use ofthe transistor with high field-effect mobility in a source driver(particularly in a demultiplexer connected to an output terminal of ashift register included in a source driver) that is included in adisplay device and supplies a signal from a signal line can reduce thenumber of wirings connected to the display device.

Impurities such as hydrogen and moisture entering the metal oxide 108adversely affect the transistor characteristics and therefore cause aproblem. Thus, it is preferable that the amount of impurities such ashydrogen and moisture in the channel region of the metal oxide 108 be assmall as possible. Furthermore, oxygen vacancies formed in the channelregion of the metal oxide 108 adversely affect the transistorcharacteristics and therefore cause a problem. For example, oxygenvacancies formed in the channel region of the metal oxide 108 are bondedto hydrogen to serve as a carrier supply source. The carrier supplysource generated in the channel region of the metal oxide 108 causes achange in the electrical characteristics, typically, a shift in thethreshold voltage, of the transistor 100A including the metal oxide 108.Thus, it is preferable that the amount of oxygen vacancies in thechannel region of the metal oxide 108 be as small as possible.

In addition, the conductive film 112 c is electrically connected to theconductive film 120 a through the opening 152 b, and the conductive film112 b is electrically connected to the conductive film 120 b through theopening 152 a. Note that the conductive film 120 a and the conductivefilm 120 b are formed by processing the same conductive film.

In addition, an insulating film 118 is provided over the transistor100A. The insulating film 118 is formed to cover the insulating film116, the conductive film 120 a, and the conductive film 120 b.

Note that in the transistor 100A, the insulating film 104 functions as afirst gate insulating film of the transistor 100A, the insulating films114 and 116 function as a second gate insulating film of the transistor100A, and the insulating film 118 functions as a protective insulatingfilm of the transistor 100A.

In addition, in the transistor 100A, the conductive film 106 functionsas a first gate electrode, the conductive film 120 a functions as asecond gate electrode, and the conductive film 120 b functions as apixel electrode included in the display device. Moreover, in thetransistor 100A, the conductive film 112 a functions as a sourceelectrode and the conductive film 112 b functions as a drain electrode.Furthermore, in the transistor 100A, the conductive film 112 c functionsas a connection electrode. In this specification and the like, theinsulating film 104 may be referred to as a first insulating film, theinsulating films 114 and 116 may be referred to as a second insulatingfilm, and the insulating film 118 may be referred to as a thirdinsulating film.

As illustrated in FIG. 5C, the conductive film 120 a functioning as thesecond gate electrode is electrically connected to the conductive film106 functioning as the first gate electrode through the conductive film112 c functioning as the connection electrode. Accordingly, theconductive film 106 and the conductive film 120 a are supplied with thesame potential.

As illustrated in FIG. 5C, the metal oxide 108 faces the conductive film106 functioning as the first gate electrode and the conductive film 120a functioning as the second gate electrode, and is positioned betweenthe two films functioning as the gate electrodes. The length of theconductive film 120 a in the channel length direction and the length ofthe conductive film 120 a in the channel width direction are longer thanthe length of the metal oxide 108 in the channel length direction andthe length of the metal oxide 108 in the channel width direction,respectively, and the whole metal oxide 108 is covered with theconductive film 120 a with the insulating films 114 and 116 providedtherebetween.

In other words, in the channel width direction of the transistor 100A,the metal oxide 108 is surrounded by the conductive film 106 functioningas the first gate electrode and the conductive film 120 a functioning asthe second gate electrode with the insulating film 104 functioning asthe first gate insulating film and the insulating films 114 and 116functioning as the second gate insulating film provided therebetween.

Such a structure makes it possible that the metal oxide 108 included inthe transistor 100A is electrically surrounded by electric fields of theconductive film 106 functioning as the first gate electrode and theconductive film 120 a functioning as the second gate electrode. A devicestructure of a transistor in which electric fields of a first gateelectrode and a second gate electrode electrically surround a metaloxide where a channel region is formed, like in the transistor 100A, canbe referred to as a surrounded channel (S-channel) structure.

Since the transistor 100A has the S-channel structure, an electric fieldfor inducing a channel can be effectively applied to the metal oxide 108by the conductive film 106 functioning as the first gate electrode;therefore, the current drive capability of the transistor 100A can beimproved and high on-state current characteristics can be obtained.Since the on-state current can be increased, it is possible to reducethe size of the transistor 100A. In addition, since the transistor 100Ahas a structure where the metal oxide 108 is surrounded by theconductive film 106 functioning as the first gate electrode and theconductive film 120 a functioning as the second gate electrode, themechanical strength of the transistor 100A can be increased.

<2-2. Structure Example 2 of Semiconductor Device>

Next, modification examples of the transistor 100A shown in FIGS. 5A to5C are described with reference to FIGS. 6A to 6D, FIGS. 7A to 7D, andFIGS. 8A to 8D.

First, description is made with reference to FIGS. 6A to 6D.

FIGS. 6A to 6C are a top view and cross-sectional views of a transistor100B, which is a modification example of the transistor 100A in FIGS. 5Ato 5C. FIG. 6D is an enlarged cross-sectional conceptual view of aregion P2 illustrated in FIG. 6B.

In the transistor 100B in FIGS. 6A to 6C, the metal oxide 108, which isalso included in the transistor 100A in FIGS. 5A to 5C, has a two-layerstructure. Specifically, the metal oxide 108 included in the transistor100B includes a metal oxide 1082 and a metal oxide 1083 over the metaloxide 1082.

For example, as the metal oxide 108_2 included in the metal oxide 108,the metal oxide of one embodiment of the present invention can be used.

As shown in the region P2 in FIG. 6D, the top surface and the sidesurface of the metal oxide 108 are in contact with the conductive film112 a; thus, contact resistance can be reduced. In addition, the metaloxide 108_2 included in the metal oxide 108 has the CAC composition inFIG. 1, and the region 002 included in the CAC composition, that is, aregion with high conductivity is in contact with the conductive film 112a; thus, the contact resistance can be further reduced. Even if a metaloxide having low conductivity, for example, an oxide with a wide bandgap (e.g., Eg is larger than or equal to 3.3 eV) is used as the metaloxide 108_3, the side surface of the metal oxide 108_2 is in contactwith the conductive film 112 a, whereby the contact resistance can bereduced. Although not illustrated, a connection between the metal oxide108 and the conductive film 112 b is similar to that in the region P2.

Next, description is made with reference to FIGS. 7A to 7D.

FIGS. 7A to 7C are a top view and cross-sectional views of a transistor100C, which is a modification example of the transistor 100A in FIGS. 5Ato 5C. FIG. 7D is an enlarged cross-sectional conceptual view of aregion P3 illustrated in FIG. 7B.

In the transistor 100C in FIGS. 7A to 7C, the metal oxide 108, which isalso included in the transistor 100A in FIGS. 5A to 5C, has athree-layer structure. Specifically, the metal oxide 108 included in thetransistor 100C includes a metal oxide 108_1, a metal oxide 1082 overthe metal oxide 108_1, and a metal oxide 1083 over the metal oxide108_2.

For example, as the metal oxide 108_2 included in the metal oxide 108,the metal oxide of one embodiment of the present invention can be used.

As shown in the region P3 in FIG. 7D, the top surface and the sidesurface of the metal oxide 108 are in contact with the conductive film112 a; thus, contact resistance can be reduced. In addition, the metaloxide 108_2 included in the metal oxide 108 has the CAC composition inFIG. 1, and the region 002 included in the CAC composition, that is, aregion with high conductivity is in contact with the conductive film 112a; thus, the contact resistance can be further reduced. Even if a metaloxide having low conductivity, for example, an oxide with a wide bandgap (e.g., Eg is larger than or equal to 3.3 eV) is used as the metaloxide 108_1 and the metal oxide 1083, the side surface of the metaloxide 1082 is in contact with the conductive film 112 a, whereby thecontact resistance can be reduced. Although not illustrated, aconnection between the metal oxide 108 and the conductive film 112 b issimilar to that in the region P3.

Then, description is made with reference to FIGS. 8A to 8D.

FIGS. 8A to 8C are a top view and cross-sectional views of a transistor100D, which is a modification example of the transistor 100A in FIGS. 5Ato 5C. FIG. 8D is an enlarged cross-sectional conceptual view of aregion P4 illustrated in FIG. 8B.

In the transistor 100D in FIGS. 8A to 8C, the metal oxide 108, which isalso included in the transistor 100A in FIGS. 5A to 5C, has athree-layer structure. Specifically, the metal oxide 108 included in thetransistor 100D includes the metal oxide 108 1, the metal oxide 108 2over the metal oxide 108_1, and the metal oxide 1083 over the metaloxide 1082.

For example, as the metal oxide 108_2 included in the metal oxide 108,the metal oxide of one embodiment of the present invention can be used.As shown in the region P4 in FIG. 8D, the top surface and the sidesurface of the metal oxide 108 are in contact with the conductive film112 a; thus, contact resistance can be reduced. In addition, the metaloxide 108_2 included in the metal oxide 108 has the CAC composition inFIG. 1, and the region 002 included in the CAC composition, that is, aregion with high conductivity is in contact with the conductive film 112a; thus, the contact resistance can be further reduced.

In addition, the position of the metal oxide 108_3 in the transistor100D is different from that in the transistor 100C, and the metal oxide108 3 included in the transistor 100D is formed over the conductivefilms 112 a and 112 b which function as a source electrode and a drainelectrode. The metal oxide 108_3 is positioned over the conductive films112 a and 112 b, whereby the contact resistance between the metal oxide108_2 and the conductive films 112 a and 112 b can be further reduced.

As illustrated in FIGS. 6A to 6D, FIGS. 7A to 7D, and FIGS. 8A to 8D, inthe transistor of one embodiment of the present invention, the metaloxide preferably has a stacked-layer structure.

<2-3. Band Structure>

Next, band structures of the metal oxide 108 which has a stacked-layerstructure are described with reference to FIGS. 16A and 16B.

FIGS. 16A and 16B show a band structure of the insulating film 104, themetal oxides 108_1, 108_2, and 108_3, and the insulating film 114 and aband structure of the insulating film 104, the metal oxides 108_2 and108_3, and the insulating film 114, respectively.

FIG. 16A shows an example of a band structure in the thickness directionof a stack including the insulating film 104, the metal oxides 108_1,108_2, and 108_3, and the insulating film 114. FIG. 16B shows an exampleof a band structure in the thickness direction of a stack including theinsulating film 104, the metal oxides 108_2 and 108_3, and theinsulating film 114. For easy understanding, the band structures showthe energy levels of the conduction band minimums (Ec) of the insulatingfilm 104, the metal oxides 108_1, 108_2, and 108_3, and the insulatingfilm 114.

As illustrated in FIG. 16A, the energy level of the conduction bandminimum gradually varies between the metal oxides 108_1, 108_2, and108_3. As illustrated in FIG. 16B, the energy level of the conductionband minimum gradually varies between the metal oxides 108_2 and 108_3.In other words, the energy level of the conduction band minimum iscontinuously changed or continuously connected. To obtain such a bandstructure, there exists no impurity which forms a defect state such as atrap center or a recombination center at the interface between the metaloxides 108 1 and 108 2 and the interface between the metal oxides 108 2and 108_3.

To form a continuous junction between the metal oxides 108_1, 108_2, and108_3, it is necessary to form the films successively without exposureto the air by using a multi-chamber deposition apparatus (sputteringapparatus) provided with a load lock chamber.

With the band structure of FIG. 16A or FIG. 16B, the metal oxide 1082serves as a well, and a channel region is formed in the metal oxide108_2 in the transistor with the stacked-layer structure.

As the metal oxide 108_2, the metal oxide of one embodiment of thepresent invention can be used. In FIGS. 16A and 16B, the band structuresof the metal oxide 108_2 each have a flat shape; however, the metaloxide 108_2 may have any of the band structures in FIGS. 3A to 3Cdescribed in Embodiment 1.

The metal oxides 108_1 and 108_3 are provided, whereby trap states whichcan be formed in the metal oxide 108_2 can be provided in the metaloxide 108_1 or 108_3. Thus, it is difficult to form the trap states inthe metal oxide 108_2.

In addition, the trap states might be more distant from the vacuum levelthan the energy level of the conduction band minimum (Ec) of the metaloxide 108_2 functioning as a channel region, so that electrons arelikely to be accumulated in the trap states. When the electrons areaccumulated in the trap states, the electrons become negative fixedcharges, so that the threshold voltage of the transistor is shifted inthe positive direction. Therefore, it is preferable that the trap statesbe closer to the vacuum level than the energy level of the conductionband minimum (Ec) of the metal oxide 108_2. Such a structure inhibitsaccumulation of electrons in the trap states. As a result, the on-statecurrent and the field-effect mobility of the transistor can beincreased.

The energy level of the conduction band minimum of each of the metaloxides 108_1 and 108_3 is closer to the vacuum level than that of themetal oxide 108_2. A typical difference between the energy level of theconduction band minimum of the metal oxide 108_2 and the energy level ofthe conduction band minimum of each of the metal oxides 108_1 and 108_3is 0.15 eV or more or 0.5 eV or more and 2 eV or less or 1 eV or less.That is, the difference between the electron affinity of each of themetal oxides 108_1 and 108_3 and the electron affinity of the metaloxide 108_2 is 0.15 eV or more or 0.5 eV or more and 2 eV or less or 1eV or less.

In such a structure, the metal oxide 108_2 serves as a main path of acurrent. In other words, the metal oxide 108_2 serves as a channelregion, and the metal oxides 108_1 and 108_3 serve as oxide insulatingfilms. It is preferable that the metal oxides 108_1 and 108_3 eachinclude one or more metal elements and the element M constituting a partof the metal oxide 108_2 in which a channel region is formed. With sucha structure, interface scattering hardly occurs at the interface betweenthe metal oxide 108_1 and the metal oxide 108_2 and at the interfacebetween the metal oxide 1082 and the metal oxide 108_3. Thus, thetransistor can have high field-effect mobility because the movement ofcarriers is not hindered at the interface.

To prevent each of the metal oxides 108_1 and 108_3 from functioning aspart of a channel region, a material having sufficiently lowconductivity is used for the metal oxides 108_1 and 108_3. Thus, themetal oxides 108_1 and 108_3 can be referred to as oxide insulatingfilms for such properties and/or functions. Alternatively, a materialthat has a smaller electron affinity (a difference between the vacuumlevel and the energy level of the conduction band minimum) than themetal oxide 108_2 and has a difference in the energy level of theconduction band minimum from the metal oxide 108_2 (band offset) is usedfor the metal oxides 108_1 and 108_3. Furthermore, to inhibit generationof a difference in threshold voltage due to the value of the drainvoltage, it is preferable to form the metal oxides 108_1 and 108_3 usinga material whose energy level of the conduction band minimum is closerto the vacuum level than that of the metal oxide 108_2. For example, adifference between the energy level of the conduction band minimum ofthe metal oxide 108_2 and the energy level of the conduction bandminimum of each of the metal oxides 108_1 and 108_3 is preferablygreater than or equal to 0.2 eV, further preferably greater than orequal to 0.5 eV.

It is preferable that the metal oxides 108_1 and 108_3 not have a spinelcrystal structure. This is because if the metal oxides 108_1 and 108_3have a spinel crystal structure, constituent elements of the conductivefilms 120 a and 120 b might be diffused into the metal oxide 108_2 atthe interface between the spinel crystal structure and another region.Note that each of the metal oxides 108_1 and 108_3 is preferably aCAAC-OS film, in which case a higher blocking property againstconstituent elements of the conductive films 120 a and 120 b, forexample, copper elements, can be obtained.

The metal oxides 108_1 and 108_3 can be formed using a metal oxidetarget having an atomic ratio of In:Ga:Zn=1:1:1, In:Ga:Zn=1:3:4,In:Ga:Zn=1:3:6, or the like.

<2-4. Structure Example 3 of Semiconductor Device>

Next, a transistor having a structure different from those of thetransistors described above is described with reference to FIGS. 9A to9D.

FIG. 9A is a top view of a transistor 200A that is a semiconductordevice of one embodiment of the present invention. FIG. 9B is across-sectional view taken along dashed-dotted line X1-X2 in FIG. 9A.FIG. 9C is a cross-sectional view taken along dashed-dotted line Y1-Y2in FIG. 9A. FIG. 9D is an enlarged cross-sectional conceptual view of aregion P5 illustrated in FIG. 9B.

The transistor 200A illustrated in FIGS. 9A to 9C has what is called atop-gate structure.

The transistor 200A includes a conductive film 206 over a substrate 202,an insulating film 204 over the substrate 202 and the conductive film206, a metal oxide 208 over the insulating film 204, an insulating film210 over the metal oxide 208, a conductive film 212 over the insulatingfilm 210, and an insulating film 216 over the insulating film 204, themetal oxide 208, and the conductive film 212.

As the metal oxide 208, the metal oxide of one embodiment of the presentinvention is preferably used.

The metal oxide 208 includes a region 208 i overlapping with theconductive film 212 and being in contact with the insulating film 210and regions 208 n overlapping with the insulating film 216. The regions208 n each include a region having a higher carrier density than theregion 208 i. That is, the metal oxide 208 includes a plurality ofregions having different carrier densities. In addition, the regions 208n can be referred to as a source region and a drain region.

Here, a connection between the region 208 i and the region 208 n isdescribed with reference to FIG. 9D.

As illustrated in the region P5 in FIG. 9D, a side surface of the region208 i is in contact with a side surface of the region 208 n; thus,contact resistance can be reduced. In addition, the region 208 i of themetal oxide 208 has the CAC composition in FIG. 1, and the region 002included in the CAC composition, i.e., a region with high conductivityis in contact with the region 208 n, i.e., the source region; thus,contact resistance can be further reduced. Although not illustrated, aconnection between the other side surface of the region 208 i and a sidesurface of the region 208 n is similar to that in the region P5.

The metal oxide of one embodiment of the present invention includes ahighly conductive region and the contact resistance between the metaloxide and the source region or the drain region is reduced. Thus, thefield-effect mobility of the transistor including the metal oxide can beincreased.

The regions 208 n are also in contact with the insulating film 216. Theinsulating film 216 contains nitrogen or hydrogen. Thus, nitrogen orhydrogen in the insulating film 216 is added to the regions 208 n. Theregions 208 n have an increased carrier density owing to the addition ofnitrogen or hydrogen from the insulating film 216.

The transistor 200A may further include an insulating film 218 over theinsulating film 216, a conductive film 220 a electrically connected tothe region 208 n through an opening 241 a provided in the insulatingfilms 216 and 218, and a conductive film 220 b electrically connected tothe region 208 n through an opening 241 b provided in the insulatingfilms 216 and 218.

As illustrated in FIG. 9C, an opening 243 is provided in the insulatingfilms 204 and 210. The conductive film 206 is electrically connected tothe conductive film 212 through the opening 243. Thus, the samepotential is applied to the conductive film 206 and the conductive film212. Different potentials may be applied to the conductive film 206 andthe conductive film 212 without providing the opening 243.

Note that the conductive film 206 functions as a first gate electrode(also referred to as a bottom-gate electrode), the conductive film 212functions as a second gate electrode (also referred to as a top-gateelectrode), the insulating film 204 functions as a first gate insulatingfilm, and the insulating film 210 functions as a second gate insulatingfilm.

In this manner, the transistor 200A in FIGS. 9A to 9C has a structure inwhich conductive films functioning as gate electrodes are provided overand under the metal oxide 208. As in the transistor 200A, asemiconductor device of one embodiment of the present invention may havetwo or more gate electrodes.

As illustrated in FIG. 9C, the metal oxide 208 faces the conductive film206 functioning as a first gate electrode and the conductive film 212functioning as a second gate electrode and is positioned between the twoconductive films functioning as the gate electrodes.

Furthermore, the length of the conductive film 212 in the channel widthdirection is larger than the length of the metal oxide 208 in thechannel width direction. In the channel width direction, the whole metaloxide 208 is covered with the conductive film 212 with the insulatingfilm 210 provided therebetween. Since the conductive film 212 isconnected to the conductive film 206 through the opening 243 provided inthe insulating films 204 and 210, a side surface of the metal oxide 208in the channel width direction faces the conductive film 212 with theinsulating film 210 provided therebetween.

In other words, in the channel width direction of the transistor 200A,the conductive films 206 and 212 are connected to each other through theopening 243 provided in the insulating films 204 and 210, and theconductive films 206 and 212 surround the metal oxide 208 with theinsulating films 204 and 210 positioned therebetween. That is, thetransistor 200A has the S-channel structure described above.

<2-5. Structure Example 4 of Semiconductor Device>

Next, modification examples of the transistor 200A shown in FIGS. 9A to9C are described with reference to FIGS. 10A to 10D, FIGS. 11A to 11D,and FIGS. 12A to 12D.

First, description is made with reference to FIGS. 10A to 10D.

FIGS. 10A to 10C are a top view and cross-sectional views of atransistor 200B, which is a modification example of the transistor 200Ain FIGS. 9A to 9C. FIG. 10D is an enlarged cross-sectional conceptualview of a region P6 illustrated in FIG. 10B.

In the transistor 200B in FIGS. 10A to 10C, the metal oxide 208, whichis also included in the transistor 200A in FIGS. 9A to 9C, has atwo-layer structure. Specifically, the metal oxide 208 of the transistor200B includes a region 208 i_1, a region 208 i_2 over the region 2080,and regions 208 n overlapping with the insulating film 216.

For example, for the region 208 i_2 included in the metal oxide 208, themetal oxide of one embodiment of the present invention can be used.

As illustrated in the region P6 in FIG. 10D, a side surface of theregion 208 i_2 is in contact with a side surface of the region 208 n;thus, contact resistance can be reduced. In addition, the region 208 i_2of the metal oxide 208 has the CAC composition in FIG. 1, and the region002 included in the CAC composition, i.e., a region with highconductivity is in contact with the region 208 n, i.e., the sourceregion; thus, contact resistance can be further reduced. Although notillustrated, a connection between the other side surface of the region208 i_2 and a side surface of the region 208 n is similar to that in theregion P6.

Next, description is made with reference to FIGS. 11A to 11D.

FIGS. 11A to 11C are a top view and cross-sectional views of atransistor 200C, which is a modification example of the transistor 200Ain FIGS. 9A to 9C. FIG. 11D is an enlarged cross-sectional conceptualview of a region P7 illustrated in FIG. 11B.

In the transistor 200C in FIGS. 11A to 11C, the metal oxide 208, whichis also included in the transistor 200A in FIGS. 9A to 9C, has athree-layer structure. Specifically, the metal oxide 208 of thetransistor 200C includes the region 2080, the region 208 i_2 over theregion 2080, a region 2080 over the region 208 i_2, and the regions 208n overlapping with the insulating film 216.

For example, for the region 208 i_2 included in the metal oxide 208, themetal oxide of one embodiment of the present invention can be used.

As illustrated in the region P7 in FIG. 11D, a side surface of theregion 208 i_2 is in contact with a side surface of the region 208 n;thus, contact resistance can be reduced. In addition, the region 208 i_2of the metal oxide 208 has the CAC composition in FIG. 1, and the region002 included in the CAC composition, i.e., a region with highconductivity is in contact with the region 208 n, i.e., the sourceregion; thus, contact resistance can be further reduced.

Although not illustrated, a connection between the other side surface ofthe region 208 i_2 and a side surface of the region 208 n is similar tothat in the region P7.

Next, description is made with reference to FIGS. 12A to 12D.

FIGS. 12A to 12C are a top view and cross-sectional views of atransistor 200D, which is a modification example of the transistor 200Ain FIGS. 9A to 9C. FIG. 12D is an enlarged cross-sectional conceptualview of a region P8 illustrated in FIG. 12B.

In the transistor 200D in FIGS. 12A to 12C, the metal oxide 208, whichis also included in the transistor 200A in FIGS. 9A to 9C, has athree-layer structure. Specifically, the metal oxide 208 of thetransistor 200D includes the region 2080, the region 208 i_2 over theregion 2080, the region 2080 over the region 208 i_2, and the regions208 n overlapping with the insulating film 216.

For example, as the region 208 i_2 included in the metal oxide 208, themetal oxide of one embodiment of the present invention can be used. Asillustrated in the region P8, a side surface of the region 208 i_2 is incontact with a side surface of the region 208 n; thus, contactresistance can be reduced. In addition, the region 208 i_2 of the metaloxide 208 has the CAC composition in FIG. 1, and the region 002 includedin the CAC composition, i.e., a region with high conductivity is incontact with the region 208 n, i.e., the source region; thus, contactresistance can be further reduced. Although not illustrated, aconnection between the other side surface of the region 208 i_2 and aside surface of the region 208 n is similar to that in the region P8.

The metal oxide 208 included in the transistor 200D is different fromthe metal oxide 208 included in the transistor 200C in the shape of theregion 208 i_3. Specifically, in the metal oxide 208 included in thetransistor 200D, side surfaces of the region 208 i_1 and side surfacesof the region 208 i_2 are covered with the region 208 i_3. With theshape, the side surfaces of the region 208 i_1 and the side surfaces ofthe region 208 i_2 are not in contact with the insulating film 210. Withthe structure, the impurities can be prevented from entering the regions208 i_1 and 208 i_2, particularly the region 208 i_2; thus, a highlyreliable semiconductor device can be provided.

As illustrated in FIGS. 10A to 10D, FIGS. 11A to 11D, and FIGS. 12A to12D, in the transistor of one embodiment of the present invention, themetal oxide preferably has a stacked-layer structure. Note that for theband structure of the metal oxide which has a stacked-layer structure,<2-3. Band structure>can be referred to.

<2-6. Components of Semiconductor Device>

Components of the semiconductor devices of this embodiment will bedescribed below in detail.

[Substrate]

There is no particular limitation on a material and the like of thesubstrates 102 and 202 as long as the material has heat resistance highenough to withstand at least heat treatment to be performed later. Forexample, a glass substrate, a ceramic substrate, a quartz substrate, asapphire substrate, or the like may be used as the substrates 102 and202. Alternatively, a single crystal semiconductor substrate or apolycrystalline semiconductor substrate made of silicon or siliconcarbide, a compound semiconductor substrate made of silicon germanium orthe like, an SOI substrate, or the like can be used as the substrates102 and 202. Further alternatively, any of these substrates providedwith a semiconductor element may be used as the substrates 102 and 202.In the case where a glass substrate is used as the substrates 102 and202, a large-area glass substrate having any of the following sizes canbe used: the 6th generation (1500 mm×1850 mm), the 7th generation (1870mm×2200 mm), the 8th generation (2200 mm×2400 mm), the 9th generation(2400 mm×2800 mm), and the 10th generation (2950 mm×3400 mm). Thus, alarge-sized display device can be manufactured.

Alternatively, a flexible substrate may be used as the substrates 102and 202, and the transistor may be provided directly on the flexiblesubstrate. Further alternatively, a separation layer may be providedbetween the transistor and the substrate 102 or 202. The separationlayer can be used when part or the whole of a semiconductor deviceformed over the separation layer is completed and is then separated fromthe substrate 102 or 202 and transferred to another substrate. In such acase, the transistor can be transferred to a substrate having low heatresistance or a flexible substrate as well.

[Conductive Film]

The conductive films 106 and 206 each functioning as a first gateelectrode, the conductive films 112 a and 220 a each functioning as asource electrode, the conductive films 112 b and 220 b each functioningas a drain electrode, the conductive film 112 c functioning as aconnection electrode, the conductive films 120 a and 212 eachfunctioning as a second gate electrode, and the conductive film 120 bfunctioning as a pixel electrode can each be formed using a metalelement selected from chromium (Cr), copper (Cu), aluminum (Al), gold(Au), silver (Ag), zinc (Zn), molybdenum (Mo), tantalum (Ta), titanium(Ti), tungsten (W), manganese (Mn), nickel (Ni), iron (Fe), and cobalt(Co); an alloy including any of these metal elements as its component;an alloy including a combination of any of these metal elements; or thelike.

Furthermore, the conductive films 106, 112 a, 112 b, 112 c, 120 a, 120b, 206, 220 a, 220 b, and 212 can be formed using an oxide conductorsuch as an oxide including indium and tin, an oxide including tungstenand indium, an oxide including tungsten, indium, and zinc, an oxideincluding titanium and indium, an oxide including titanium, indium, andtin, an oxide including indium and zinc, an oxide including silicon,indium, and tin, or an oxide including indium, gallium, and zinc.

In particular, the above-described oxide conductor can be favorably usedfor the conductive films 120 a and 212. Note that in this specificationand the like, the oxide conductor may be referred to as OC. For example,the oxide conductor is obtained in the following manner. Oxygenvacancies are formed in an oxide semiconductor, and then hydrogen isadded to the oxygen vacancies, so that a donor level is formed in thevicinity of the conduction band.

As a result, the conductivity of the oxide semiconductor is increased,so that the oxide semiconductor becomes a conductor. An oxidesemiconductor having become a conductor can be referred to as an oxideconductor. Oxide semiconductors generally have a visible lighttransmitting property because of their large energy gap. An oxideconductor is an oxide semiconductor having a donor level in the vicinityof the conduction band. Therefore, the influence of absorption due tothe donor level on an oxide conductor is small, and the oxide conductorhas a visible light transmitting property comparable to that of an oxidesemiconductor.

A Cu—X alloy film (X is Mn, Ni, Cr, Fe, Co, Mo, Ta, or Ti) may be usedas the conductive films 106, 112 a, 112 b, 112 c, 120 a, 120 b, 206, 220a, 220 b, and 212. Use of a Cu—X alloy film enables the manufacturingcost to be reduced because a wet etching process can be used in theprocessing.

In particular, the above-described Cu-X alloy film can be favorably usedas the conductive films 112 a, 112 b, 220 a, and 220 b. Specifically,the Cu—X alloy film is preferably a Cu—Mn alloy film.

[Insulating Film Functioning as First Gate Insulating Film]

As the insulating films 104 and 204 each functioning as a first gateinsulating film of the transistor, an insulating layer including atleast one of the following films formed by a plasma-enhanced chemicalvapor deposition (PECVD) method, a sputtering method, or the like can beused: a silicon oxide film, a silicon oxynitride film, a silicon nitrideoxide film, a silicon nitride film, an aluminum oxide film, a hafniumoxide film, an yttrium oxide film, a zirconium oxide film, a galliumoxide film, a tantalum oxide film, a magnesium oxide film, a lanthanumoxide film, a cerium oxide film, and a neodymium oxide film. Note thatan insulating film of a single layer formed using a material selectedfrom the above or an insulating film of two or more layers may be usedas the insulating films 104 and 204.

Note that the insulating films that are in contact with the metal oxides108 and 208 each functioning as a channel region of the transistor arepreferably oxide insulating films and further preferably include regionseach including oxygen in excess of the stoichiometric composition(excess oxygen regions).

Note that one embodiment of the present invention is not limited to theabove structure, and a nitride insulating film may be used as theinsulating films that are in contact with the metal oxides 108 and 208.In one example, a silicon nitride film is formed and a surface of thesilicon nitride film is oxidized by performing oxygen plasma treatmentor the like on the surface of the silicon nitride film. In the casewhere oxygen plasma treatment or the like is performed on the surface ofthe silicon nitride film, the surface of the silicon nitride film may beoxidized at the atomic level. For this reason, an oxide film might notbe observed by cross-sectional observation or the like of thetransistor. That is, in the case of performing cross-sectionalobservation of the transistor, the silicon nitride film and the metaloxide may be observed to be in contact with each other in some cases. Inparticular, the metal oxide of one embodiment of the present inventiondescribed in Embodiment 1 includes a region having a large energy gap;thus, the metal oxide 108 or 208 may be in contact with the siliconnitride film.

Note that the silicon nitride film has a higher dielectric constant thana silicon oxide film and needs a larger thickness for capacitanceequivalent to that of the silicon oxide film. Thus, when the siliconnitride film is included as the gate insulating film of the transistor,the thickness of the insulating film can be increased. This makes itpossible to suppress a decrease in withstand voltage of the transistorand furthermore to increase the withstand voltage, thereby reducingelectrostatic discharge damage to the transistor.

In the case where hafnium oxide is used for the insulating films 104 and204, the following effect is attained. Hafnium oxide has a higherdielectric constant than silicon oxide and silicon oxynitride.Therefore, by using hafnium oxide, the thicknesses of the insulatingfilms 104 and 204 can be made large as compared with the case wheresilicon oxide is used; thus, leakage current due to tunnel current canbe reduced. That is, it is possible to provide a transistor with a lowoff-state current. Moreover, hafnium oxide with a crystalline structurehas higher dielectric constant than hafnium oxide with an amorphousstructure. Therefore, it is preferable to use hafnium oxide with acrystalline structure in order to provide a transistor with a lowoff-state current. Examples of the crystalline structure include amonoclinic crystal structure and a cubic crystal structure. Note thatone embodiment of the present invention is not limited thereto.

[Metal Oxide]

As the metal oxides 108 and 208, the metal oxide of one embodiment ofthe present invention described in Embodiment 1 can be used.

The energy gap of each of the metal oxides 108 and 208 is 2 eV or more,preferably 2.5 eV or more, further preferably 3 eV or more. With the useof a metal oxide having such a wide energy gap, the off-state current ofthe transistor can be reduced.

The thickness of each of the metal oxides 108 and 208 is greater than orequal to 3 nm and less than or equal to 200 nm, preferably greater thanor equal to 3 nm and less than or equal to 100 nm, further preferablygreater than or equal to 3 nm and less than or equal to 50 nm.

Furthermore, in order to obtain required semiconductor characteristicsof a transistor, it is preferable that the carrier density, the impurityconcentration, the defect density, the atomic ratio of a metal elementto oxygen, the density, and the like of each of the metal oxides 108 and208 be set to be appropriate.

[Insulating Film Functioning as Second Gate Insulating Film]

The insulating films 114, 116 and 210 each function as a second gateinsulating film of the transistor. In addition, the insulating films114, 116, and 210 each have a function of supplying oxygen to the metaloxide 108 or 208. That is, the insulating films 114, 116, and 210contain oxygen. The insulating film 114 is an insulating film that ispermeable to oxygen. The insulating film 114 also functions as a filmthat relieves damage to the metal oxide 108 at the time of forming theinsulating film 116 in a later step.

A silicon oxide film, a silicon oxynitride film, or the like with athickness greater than or equal to 5 nm and less than or equal to 150nm, preferably greater than or equal to 5 nm and less than or equal to50 nm can be used as the insulating film 114.

In addition, it is preferable that the number of defects in theinsulating film 114 be small and typically, the spin densitycorresponding to a signal that appears at g=2.001 due to a dangling bondof silicon be lower than or equal to 3×10¹⁷ spins/cm³ by electron spinresonance (ESR) measurement. This is because if the density of defectsin the insulating film 114 is high, oxygen is bonded to the defects andthe amount of oxygen that transmits the insulating film 114 isdecreased.

Note that all oxygen entering the insulating film 114 from the outsidedoes not move to the outside of the insulating film 114 and some oxygenremains in the insulating film 114. Furthermore, movement of oxygenoccurs in the insulating film 114 in some cases in such a manner thatoxygen enters the insulating film 114 and oxygen included in theinsulating film 114 moves to the outside of the insulating film 114.When an oxide insulating film that can transmit oxygen is formed as theinsulating film 114, oxygen released from the insulating film 116provided over the insulating film 114 can be moved to the metal oxide108 through the insulating film 114.

Note that the insulating film 114 can be formed using an oxideinsulating film having a low density of states due to nitrogen oxide.Note that the density of states due to nitrogen oxide can be formedbetween the energy of the valence band maximum (Ev_os) and the energy ofthe conduction band minimum (Ec_os) of the metal oxide. A siliconoxynitride film that releases less nitrogen oxide, an aluminumoxynitride film that releases less nitrogen oxide, or the like can beused as the above oxide insulating film.

Note that a silicon oxynitride film that releases less nitrogen oxide isa film of which the amount of released ammonia is larger than the amountof released nitrogen oxide in thermal desorption spectroscopy (TDS); theamount of released ammonia is typically greater than or equal to 1×10¹⁸cm⁻³ and less than or equal to 5×10¹⁹ cm⁻³. Note that the amount ofreleased ammonia is the amount of ammonia released by heat treatmentwith which the surface temperature of a film becomes higher than orequal to 50° C. and lower than or equal to 650° C., preferably higherthan or equal to 50° C. and lower than or equal to 550° C.

Nitrogen oxide (NO_(x); x is greater than 0 and less than or equal to 2,preferably greater than or equal to 1 and less than or equal to 2),typically NO₂ or NO, forms levels in the insulating film 114, forexample. The level is positioned in the energy gap of the metal oxide108. Therefore, when nitrogen oxide is diffused to the interface betweenthe insulating film 114 and the metal oxide 108, an electron is in somecases trapped by the level on the insulating film 114 side. As a result,the trapped electron remains in the vicinity of the interface betweenthe insulating film 114 and the metal oxide 108; thus, the thresholdvoltage of the transistor is shifted in the positive direction.

Nitrogen oxide reacts with ammonia and oxygen in heat treatment. Sincenitrogen oxide included in the insulating film 114 reacts with ammoniaincluded in the insulating film 116 in heat treatment, nitrogen oxideincluded in the insulating film 114 is reduced. Therefore, an electronis hardly trapped at the interface between the insulating film 114 andthe metal oxide 108.

By using such an oxide insulating film, the insulating film 114 canreduce the shift in the threshold voltage of the transistor, which leadsto a smaller change in the electrical characteristics of the transistor.

Note that in an ESR spectrum at 100 K or lower of the insulating film114, by heat treatment of a manufacturing process of the transistor,typically heat treatment at a temperature higher than or equal to 300°C. and lower than 350° C., a first signal that appears at a g-factor ofgreater than or equal to 2.037 and less than or equal to 2.039, a secondsignal that appears at a g-factor of greater than or equal to 2.001 andless than or equal to 2.003, and a third signal that appears at ag-factor of greater than or equal to 1.964 and less than or equal to1.966 are observed. The split width of the first and second signals andthe split width of the second and third signals that are obtained by ESRmeasurement using an X-band are each approximately 5 mT. The sum of thespin densities of the first signal that appears at a g-factor of greaterthan or equal to 2.037 and less than or equal to 2.039, the secondsignal that appears at a g-factor of greater than or equal to 2.001 andless than or equal to 2.003, and the third signal that appears at ag-factor of greater than or equal to 1.964 and less than or equal to1.966 is lower than 1×10¹⁸ spins/cm³, typically higher than or equal to1×10¹⁷ spins/cm³ and lower than 1×10¹⁸ spins/cm³.

In the ESR spectrum at 100 K or lower, the sum of the spin densities ofthe first signal that appears at a g-factor of greater than or equal to2.037 and less than or equal to 2.039, the second signal that appears ata g-factor of greater than or equal to 2.001 and less than or equal to2.003, and the third signal that appears at a g-factor of greater thanor equal to 1.964 and less than or equal to 1.966 corresponds to the sumof the spin densities of signals attributed to nitrogen oxide (NO_(x); xis greater than 0 and less than or equal to 2, preferably greater thanor equal to 1 and less than or equal to 2). Typical examples of nitrogenoxide include nitrogen monoxide and nitrogen dioxide. In other words,the lower the sum of the spin densities of the first signal that appearsat a g-factor of greater than or equal to 2.037 and less than or equalto 2.039, the second signal that appears at a g-factor of greater thanor equal to 2.001 and less than or equal to 2.003, and the third signalthat appears at a g-factor of greater than or equal to 1.964 and lessthan or equal to 1.966 is, the lower the content of nitrogen oxide inthe oxide insulating film is.

The concentration of nitrogen of the above oxide insulating filmmeasured by SIMS is lower than or equal to 6×10²⁰ atoms/cm³.

The above oxide insulating film is formed by a PECVD method at asubstrate temperature higher than or equal to 220° C. and lower than orequal to 350° C. using silane and dinitrogen monoxide, whereby a denseand hard film can be formed.

The insulating films 116 and 210 are preferably formed using an oxideinsulating film whose oxygen content is higher than that in thestoichiometric composition. Part of oxygen is released by heating fromthe oxide insulating film whose oxygen content is higher than that inthe stoichiometric composition. The oxide insulating film whose oxygencontent is higher than that in the stoichiometric composition is anoxide insulating film of which the amount of released oxygen convertedinto oxygen atoms is greater than or equal to 1.0×10¹⁹ atoms/cm³,preferably greater than or equal to 3.0×10²⁰ atoms/cm³ in TDS. Note thatthe surface temperature of the film in the TDS is preferably higher thanor equal to 100° C. and lower than or equal to 700° C., or higher thanor equal to 100° C. and lower than or equal to 500° C.

A silicon oxide film, a silicon oxynitride film, or the like with athickness greater than or equal to 30 nm and less than or equal to 500nm, preferably greater than or equal to 50 nm and less than or equal to400 nm can be used as the insulating films 116 and 210.

It is preferable that the number of defects in the insulating films 116and 210 be small, and typically the spin density corresponding to asignal that appears at g=2.001 due to a dangling bond of silicon belower than 1.5×10¹⁸ spins/cm³, preferably lower than or equal to 1×10¹⁸spins/cm³ by ESR measurement. Note that the insulating film 116 isprovided more apart from the metal oxide 108 than the insulating film114 is; thus, the insulating film 116 may have higher density of defectsthan the insulating film 114.

Furthermore, the insulating films 114 and 116 can be formed usinginsulating films formed of the same kinds of materials; thus, a boundarybetween the insulating films 114 and 116 cannot be clearly observed insome cases. Thus, in this embodiment, the boundary between theinsulating films 114 and 116 is shown by a dashed line. Although atwo-layer structure of the insulating films 114 and 116 is described inthis embodiment, one embodiment of the present invention is not limitedthereto. For example, a single-layer structure of the insulating film114 or a stacked-layer structure of three or more layers may be used.

[Insulating Film Functioning as Protective Insulating Film]

The insulating films 118 and 216 each function as a protectiveinsulating film for the transistor.

The insulating films 118 and 216 contain either hydrogen or nitrogen, orboth. Alternatively, the insulating films 118 and 216 contain nitrogenand silicon. The insulating films 118 and 216 each have a function ofblocking oxygen, hydrogen, water, alkali metal, alkaline earth metal,and the like. It is possible to prevent outward diffusion of oxygen fromthe metal oxides 108 and 208, outward diffusion of oxygen included inthe insulating films 114, 116, and 210, and entry of hydrogen, water, orthe like into the metal oxides 108 and 208 from the outside by providingthe insulating films 118 and 216.

As the insulating films 118 and 216, a nitride insulating film can beused, for example. The nitride insulating film is formed using siliconnitride, silicon nitride oxide, aluminum nitride, aluminum nitrideoxide, or the like.

Although the above-described variety of films such as the conductivefilms, the insulating films, the metal oxide, and the metal film can beformed by a sputtering method or a PECVD method, they may be formed byanother method, e.g., a thermal chemical vapor deposition (CVD) method.Examples of the thermal CVD method include a metal organic chemicalvapor deposition (MOCVD) method, an atomic layer deposition (ALD)method, and the like.

The thermal CVD method has an advantage that no defect due to plasmadamage is generated since it does not utilize plasma for forming a film.

Deposition by the thermal CVD method may be performed in such a mannerthat a source gas and an oxidizer are supplied to a chamber at a timewhile the pressure in the chamber is set to an atmospheric pressure or areduced pressure, and the source gas and the oxidizer react with eachother in the vicinity of the substrate or over the substrate.

Deposition by an ALD method may be performed in such a manner that thepressure in a chamber is set to an atmospheric pressure or a reducedpressure, source gases for reaction are sequentially introduced into thechamber, and then the sequence of the gas introduction is repeated.

The variety of films such as the conductive films, the insulating films,and the metal oxide in this embodiment can be formed by a thermal CVDmethod such as an MOCVD method or an ALD method.

<2-7. Method for Manufacturing Semiconductor Device>

Next, a method for manufacturing the transistor 200C that is asemiconductor device of one embodiment of the present invention isdescribed with reference to FIGS. 13A to 13D, FIGS. 14A to 14C, andFIGS. 15A to 15C.

FIGS. 13A to 13D, FIGS. 14A to 14C, and FIGS. 15A to 15C arecross-sectional views illustrating a method for manufacturing asemiconductor device. In FIGS. 13A to 13D, FIGS. 14A to 14C, and FIGS.15A to 15C, cross-sectional views in the channel length direction are onthe left side, and cross-sectional views in the channel width directionare on the right side.

First, the conductive film 206 is formed over the substrate 202. Next,the insulating film 204 is formed over the substrate 202 and theconductive film 206, and a first metal oxide, a second metal oxide, anda third metal oxide are formed over the insulating film 204. Then, thefirst metal oxide, the second metal oxide, and the third metal oxide areprocessed into an island shape, whereby a metal oxide 208_1 a, a metaloxide 208_2 a, and a metal oxide 208_3 a are formed (see FIG. 13A).

The conductive film 206 can be formed using a material selected from theabove-mentioned materials. In this embodiment, for the conductive film206, a stack including a 50-nm-thick tungsten film and a 400-nm-thickcopper film is formed with a sputtering apparatus.

To process a conductive film to be the conductive film 206, a wetetching method and/or a dry etching method can be used. In thisembodiment, in the processing of the conductive film into the conductivefilm 206, the copper film is etched by a wet etching method, and thenthe tungsten film is etched by a dry etching method.

The insulating film 204 can be formed by a sputtering method, a CVDmethod, an evaporation method, a pulsed laser deposition (PLD) method, aprinting method, a coating method, or the like as appropriate. In thisembodiment, as the insulating film 204, a 400-nm-thick silicon nitridefilm and a 50-nm-thick silicon oxynitride film are formed with a PECVDapparatus.

After the insulating film 204 is formed, oxygen may be added to theinsulating film 204. As oxygen added to the insulating film 204, anoxygen radical, an oxygen atom, an oxygen atomic ion, an oxygenmolecular ion, or the like may be used. Oxygen can be added by an iondoping method, an ion implantation method, a plasma treatment method, orthe like. Alternatively, a film that suppresses oxygen release may beformed over the insulating film 204, and then oxygen may be added to theinsulating film 204 through the film.

The film that suppresses oxygen release can be formed using a conductivefilm or a semiconductor film containing one or more of indium, zinc,gallium, tin, aluminum, chromium, tantalum, titanium, molybdenum,nickel, iron, cobalt, and tungsten.

In the case where oxygen is added by plasma treatment in which oxygen isexcited by a microwave to generate high-density oxygen plasma, theamount of oxygen added to the insulating film 204 can be increased.

The metal oxide 208_1 a, the metal oxide 208 2 a, and the metal oxide208 3 a are preferably formed successively in a vacuum using asputtering apparatus. By successive formation of the metal oxide 208_1a, the metal oxide 208 2 a, and the metal oxide 208 3 a in a vacuumusing a sputtering apparatus, impurities (such as hydrogen and water)that can be attached to each interface can be reduced.

The metal oxide 208_2 a is preferably formed with a lower oxygen partialpressure than the metal oxide 208_1 a and/or the metal oxide 2083 a.

In forming the metal oxide 208_la, the metal oxide 208_2 a, and themetal oxide 208_3 a, an inert gas (such as a helium gas, an argon gas,or a xenon gas) may be mixed into the oxygen gas. Note that theproportion of the oxygen gas in the whole deposition gas (hereinafteralso referred to as oxygen flow rate ratio) in forming the metal oxide208_1 a is higher than or equal to 70% and lower than or equal to 100%,preferably higher than or equal to 80% and lower than or equal to 100%,further preferably higher than or equal to 90% and lower than or equalto 100%. The oxygen flow rate ratio in forming the metal oxide 208_2 ais higher than 0% and lower than or equal to 30%, preferably higher thanor equal to 5% and lower than or equal to 15%. The oxygen flow rateratio in forming the metal oxide 208_3 a is higher than or equal to 70%and lower than or equal to 100%, preferably higher than or equal to 80%and lower than or equal to 100%, further preferably higher than or equalto 90% and lower than or equal to 100%.

Note that the metal oxide 208_2 a may be formed at a lower substratetemperature than the metal oxide 208_1 a and/or the metal oxide 2083 a.

Specifically, the metal oxide 208_2 a is formed at a substratetemperature higher than or equal to room temperature and lower than 150°C., preferably higher than or equal to room temperature and lower thanor equal to 140° C. In addition, the metal oxide 208_1 a and the metaloxide 208_3 a are formed at a substrate temperature higher than or equalto room temperature and lower than or equal to 300° C., preferablyhigher than or equal to room temperature and lower than or equal to 200°C. Note that the substrate temperatures when the metal oxides 208_1 a,208_2 a, and 208_3 a are formed are preferably the same (e.g., higherthan or equal to room temperature and lower than 150° C.) because theproductivity is increased.

Under the above-described conditions, the metal oxide 208_2 a can have aregion with lower crystallinity than the metal oxides 208_la and 208_3a.

The thickness of the metal oxide 208_la is greater than or equal to 1 nmand less than 20 nm, preferably greater than or equal to 5 nm and lessthan or equal to 10 nm. The thickness of the metal oxide 208_2 a isgreater than or equal to 20 nm and less than or equal to 100 nm,preferably greater than or equal to 20 nm and less than or equal to 50nm. The thickness of the metal oxide 208_3 a is greater than or equal to1 nm and less than 20 nm, preferably greater than or equal to 5 nm andless than or equal to 15 nm.

Note that the metal oxide 208_1 a, the metal oxide 208_2 a, and themetal oxide 208_3 a are formed while being heated, so that thecrystallinity of the metal oxide 208_1 a, the metal oxide 208_2 a, andthe metal oxide 208_3 a can be increased. On the other hand, in the casewhere a large-sized glass substrate (e.g., the 6th generation to the10th generation) is used as the substrate 202 and the metal oxide 208_1a, the metal oxide 208_2 a, and the metal oxide 208_3 a are formed at asubstrate temperature higher than or equal to 200° C. and lower than orequal to 300° C., the substrate 202 might be changed in shape (distortedor warped). Therefore, in the case where a large-sized glass substrateis used, the change in the shape of the glass substrate can besuppressed by forming the metal oxide 208_1 a, the metal oxide 208_2 a,and the metal oxide 208_3 a at a substrate temperature higher than orequal to 100° C. and lower than 200° C.

In addition, increasing the purity of the sputtering gas is necessary.For example, when a gas which is highly purified to have a dew point of−40° C. or lower, preferably −80° C. or lower, further preferably −100°C. or lower, still further preferably −120° C. or lower, is used as thesputtering gas, i.e., the oxygen gas or the argon gas, entry of moistureor the like into the metal oxide can be minimized.

In the case where the metal oxide is deposited by a sputtering method, achamber in a sputtering apparatus is preferably evacuated to be a highvacuum state (to the degree of about 5×10⁻⁷ Pa to 1×10⁻⁴ Pa) with anadsorption vacuum evacuation pump such as a cryopump in order to removewater or the like, which serves as an impurity for the metal oxide, asmuch as possible. In particular, the partial pressure of gas moleculescorresponding to H₂O (gas molecules corresponding to m/z=18) in thechamber in the standby mode of the sputtering apparatus is preferablylower than or equal to 1×10⁻⁴ Pa, further preferably lower than or equalto 5×10⁻⁵ Pa.

To process the first metal oxide, the second metal oxide, and the thirdmetal oxide into the metal oxide 208_1 a, the metal oxide 208_2 a, andthe metal oxide 208_3 a, a wet etching method and/or a dry etchingmethod can be used.

After the metal oxide 208_1 a, the metal oxide 208 2 a, and the metaloxide 208_3 a are formed, the metal oxide 208_1 a, the metal oxide 208_2a, and the metal oxide 208_3 a may be dehydrated or dehydrogenated byheat treatment. The temperature of the heat treatment is typicallyhigher than or equal to 150° C. and lower than the strain point of thesubstrate, higher than or equal to 250° C. and lower than or equal to450° C., or higher than or equal to 300° C. and lower than or equal to450° C.

The heat treatment can be performed in an inert gas atmospherecontaining nitrogen or a rare gas such as helium, neon, argon, xenon, orkrypton. Alternatively, the heat treatment may be performed in an inertgas atmosphere first, and then in an oxygen atmosphere. It is preferablethat the above inert gas atmosphere and the above oxygen atmosphere notcontain hydrogen, water, or the like. The treatment time may be longerthan or equal to 3 minutes and shorter than or equal to 24 hours.

An electric furnace, an RTA apparatus, or the like can be used for theheat treatment. With the use of an RTA apparatus, the heat treatment canbe performed at a temperature higher than or equal to the strain pointof the substrate if the heating time is short. Therefore, the heattreatment time can be shortened.

By depositing the metal oxide while it is heated or by performing heattreatment after the deposition of the metal oxide, the hydrogenconcentration in the metal oxide, which is measured by SIMS, can be5×10¹⁹ atoms/cm³ or lower, 1×10¹⁹ atoms/cm³ or lower, 5×10¹⁸ atoms/cm³or lower, 1×10¹⁸ atoms/cm³ or lower, 5×10¹⁷ atoms/cm³ or lower, or1×10¹⁶ atoms/cm³ or lower.

Next, an insulating film 210_0 is formed over the insulating film 204and the metal oxide 208_3 a (see FIG. 13B).

For the insulating film 210_0, a silicon oxide film, a siliconoxynitride film, or a silicon nitride film can be formed with aplasma-enhanced chemical vapor deposition apparatus (also referred to asa PECVD apparatus or simply a plasma CVD apparatus). In this case, adeposition gas containing silicon and an oxidizing gas are preferablyused as a source gas. Typical examples of the deposition gas containingsilicon include silane, disilane, trisilane, and silane fluoride.Examples of the oxidizing gas include oxygen, ozone, dinitrogenmonoxide, and nitrogen dioxide.

A silicon oxynitride film having few defects can be formed as theinsulating film 210_0 with the PECVD apparatus under the conditions thatthe flow rate of the oxidizing gas is more than 20 times and less than100 times, or more than or equal to 40 times and less than or equal to80 times the flow rate of the deposition gas and that the pressure in atreatment chamber is lower than 100 Pa or lower than or equal to 50 Pa.

As the insulating film 210_0, a dense silicon oxide film or a densesilicon oxynitride film can be formed under the following conditions:the substrate placed in a vacuum-evacuated treatment chamber of thePECVD apparatus is held at a temperature higher than or equal to 280° C.and lower than or equal to 400° C.; the pressure in the treatmentchamber into which a source gas is introduced is set to be higher thanor equal to 20 Pa and lower than or equal to 250 Pa, preferably higherthan or equal to 100 Pa and lower than or equal to 250 Pa; and ahigh-frequency power is supplied to an electrode provided in thetreatment chamber.

The insulating film 210_0 may be formed by a PECVD method using amicrowave. A microwave refers to a wave in the frequency range of 300MHz to 300 GHz. In the case of using a microwave, electron temperatureand electron energy are low. Furthermore, in supplied power, theproportion of power used for acceleration of electrons is low, andtherefore, much more power can be used for dissociation and ionizationof molecules. Thus, plasma with a high density (high-density plasma) canbe excited. This method causes little plasma damage to the depositionsurface or a deposit, so that the insulating film 210_0 having fewdefects can be formed.

In this embodiment, as the insulating film 210_0, a 100-nm-thick siliconoxynitride film is formed with the PECVD apparatus.

Subsequently, a mask is formed by lithography in a desired position overthe insulating film 210_0, and then the insulating film 210_0 and theinsulating film 204 are partly etched, so that the opening 243 reachingthe conductive film 206 is formed (see FIG. 13C).

To form the opening 243, a wet etching method and/or a dry etchingmethod can be used. In this embodiment, the opening 243 is formed by adry etching method.

Next, a conductive film 212_0 is formed over the conductive film 206 andthe insulating film 210_0 so as to cover the opening 243. In the casewhere a metal oxide film is used as the conductive film 212_0, forexample, oxygen might be added to the insulating film 210_0 during theformation of the conductive film 212_0 (see FIG. 13D).

In FIG. 13D, oxygen added to the insulating film 210_0 is schematicallyshown by arrows. Furthermore, the conductive film 212_0 formed to coverthe opening 243 is electrically connected to the conductive film 206.

In the case where a metal oxide film is used as the conductive film212_0, the conductive film 212_0 is preferably formed by a sputteringmethod in an atmosphere containing an oxygen gas. Formation of theconductive film 212_0 in an atmosphere containing an oxygen gas allowssuitable addition of oxygen to the insulating film 210_0. Note that amethod for forming the conductive film 212_0 is not limited to asputtering method, and another method such as an ALD method may be used.

In this embodiment, a 100-nm-thick In-Ga-Zn oxide film (In:Ga:Zn=4:2:4.1(atomic ratio)) is formed as the conductive film 212_0 by a sputteringmethod. Oxygen addition treatment may be performed on the insulatingfilm 210_0 before or after the formation of the conductive film 212_0.The oxygen addition treatment can be performed similarly to the oxygenaddition treatment that can be performed after the formation of theinsulating film 204.

Subsequently, a mask 240 is formed by a lithography process in a desiredposition over the conductive film 212_0 (see FIG. 14A).

Next, etching is performed from above the mask 240 to process theconductive film 212_0 and the insulating film 210_0. After theprocessing of the conductive film 212_0 and the insulating film 210_0,the mask 240 is removed. As a result of the processing of the conductivefilm 212_0 and the insulating film 210_0, the island-shaped conductivefilm 212 and the island-shaped insulating film 210 are formed (see FIG.14B).

In this embodiment, the conductive film 212_0 and the insulating film210_0 are processed by a dry etching method.

In the processing of the conductive film 212_0 and the insulating film210_0, the thickness of the metal oxide 208 in a region not overlappingwith the conductive film 212 is decreased in some cases. In other cases,in the processing of the conductive film 212_0 and the insulating film210_0, the thickness of the insulating film 204 in a region notoverlapping with the metal oxide 208 is decreased. In the processing ofthe conductive film 212_0 and the insulating film 210_0, an etchant oran etching gas (e.g., chlorine) might be added to the metal oxide 208 orthe constituent element of the conductive film 212_0 or the insulatingfilm 210_0 might be added to the metal oxide 208.

Next, the insulating film 216 is formed over the insulating film 204,the metal oxide 208, and the conductive film 212. By the formation ofthe insulating film 216, the metal oxide 208 in contact with theinsulating film 216 becomes the regions 208 n. In addition, the region2080, the region 208 i_2, and the region 208 i_3 are formed in the metaloxide 208 overlapping with the conductive film 212 (see FIG. 14C).

The insulating film 216 can be formed using a material selected from theabove-mentioned materials. In this embodiment, as the insulating film216, a 100-nm-thick silicon nitride oxide film is formed with a PECVDapparatus. In the formation of the silicon nitride oxide film, twosteps, i.e., plasma treatment and deposition treatment, are performed ata temperature of 220° C. The plasma treatment is performed under thefollowing conditions: an argon gas at a flow rate of 100 sccm and anitrogen gas at a flow rate of 1000 sccm are introduced into a chamberbefore deposition; the pressure in the chamber is set to 40 Pa; and apower of 1000 W is supplied to an RF power source (27.12 MHz). Thedeposition treatment is performed under the following conditions: asilane gas at a flow rate of 50 sccm, a nitrogen gas at a flow rate of5000 sccm, and an ammonia gas at a flow rate of 100 sccm are introducedinto the chamber; the pressure in the chamber is set to 100 Pa; and apower of 1000 W is supplied to the RF power source (27.12 MHz).

When a silicon nitride oxide film is used as the insulating film 216,nitrogen or hydrogen in the silicon nitride oxide film can be suppliedto the regions 208 n in contact with the insulating film 216. Inaddition, when the formation temperature of the insulating film 216 isthe above temperature, release of excess oxygen contained in theinsulating film 210 to the outside can be suppressed.

Next, the insulating film 218 is formed over the insulating film 216(see FIG. 15A).

The insulating film 218 can be formed using a material selected from theabove-mentioned materials. In this embodiment, as the insulating film218, a 300-nm-thick silicon oxynitride film is formed with a PECVDapparatus.

Subsequently, a mask is formed by lithography in a desired position overthe insulating film 218, and then the insulating film 218 and theinsulating film 216 are partly etched, so that the opening 241 a and theopening 241 b reaching the regions 208 n are formed (see FIG. 15B).

To etch the insulating film 218 and the insulating film 216, a wetetching method and/or a dry etching method can be used. In thisembodiment, the insulating film 218 and the insulating film 216 areprocessed by a dry etching method.

Next, a conductive film is formed over the regions 208 n and theinsulating film 218 so as to cover the openings 241 a and 241 b, and theconductive film is processed into a desired shape, whereby theconductive films 220 a and 220 b are formed (see FIG. 15C).

The conductive films 220 a and 220 b can be formed using a materialselected from the above-mentioned materials. In this embodiment, for theconductive films 220 a and 220 b, a stack including a 50-nm-thicktungsten film and a 400-nm-thick copper film is formed with a sputteringapparatus.

To process the conductive film to be the conductive films 220 a and 220b, a wet etching method and/or a dry etching method can be used. In thisembodiment, in the processing of the conductive film into the conductivefilms 220 a and 220 b, the copper film is etched by a wet etchingmethod, and then the tungsten film is etched by a dry etching method.

Through the above steps, the transistor 200C in FIGS. 11A to 11C can bemanufactured.

Note that the films included in the transistor (the insulating film, themetal oxide, the conductive film, and the like) can be formed by, otherthan the above methods, a sputtering method, a chemical vapor deposition(CVD) method, a vacuum evaporation method, a pulsed laser deposition(PLD) method, or an ALD method. Alternatively, a coating method or aprinting method can be used. Although a sputtering method and a PECVDmethod are typical examples of the deposition method, a thermal CVDmethod may be used. As an example of a thermal CVD method, a metalorganic chemical vapor deposition (MOCVD) method can be given.

Deposition by the thermal CVD method may be performed in such a mannerthat the pressure in a chamber is set to an atmospheric pressure or areduced pressure, and a source gas and an oxidizer are supplied to thechamber at a time and react with each other in the vicinity of thesubstrate or over the substrate. Thus, no plasma is generated in thedeposition; therefore, the thermal CVD method has an advantage that nodefect due to plasma damage is caused.

Note that the structures and the methods described in this embodimentcan be used in appropriate combination with any of the structures andthe methods described in the other embodiments.

Embodiment 3

In this embodiment, an example of a display panel which can be used fora display portion or the like in a display device including thesemiconductor device of one embodiment of the present invention isdescribed with reference to FIG. 17 and FIG. 18. The display paneldescribed below as an example includes both a reflective liquid crystalelement and a light-emitting element and can display an image in boththe transmissive mode and the reflective mode. Note that the metal oxideof one embodiment of the present invention and a transistor includingthe metal oxide can be preferably used in a transistor in a pixel of adisplay device, a driver for driving the display device, an LSIsupplying data to the display device, or the like.

<3-1. Structure Example of Display Panel>

FIG. 17 is a schematic perspective view illustrating a display panel 600of one embodiment of the present invention. In the display panel 600, asubstrate 651 and a substrate 661 are attached to each other. In FIG.17, the substrate 661 is denoted by a dashed line.

The display panel 600 includes a display portion 662, a circuit 659, awiring 666, and the like. The substrate 651 is provided with the circuit659, the wiring 666, a conductive film 663 which serves as a pixelelectrode, and the like. In FIG. 17, an IC 673 and an FPC 672 aremounted on the substrate 651. Thus, the structure illustrated in FIG. 17can be referred to as a display module including the display panel 600,the FPC 672, and the IC 673.

As the circuit 659, for example, a circuit functioning as a scan linedriver circuit can be used.

The wiring 666 has a function of supplying a signal or electric power tothe display portion 662 or the circuit 659. The signal or electric poweris input to the wiring 666 from the outside through the FPC 672 or fromthe IC 673.

FIG. 17 shows an example in which the IC 673 is provided on thesubstrate 651 by a chip on glass (COG) method or the like. As the IC673, an IC functioning as a scan line driver circuit, a signal linedriver circuit, or the like can be used. Note that it is possible thatthe IC 673 is not provided when, for example, the display panel 600includes circuits serving as a scan line driver circuit and a signalline driver circuit and when the circuits serving as a scan line drivercircuit and a signal line driver circuit are provided outside and asignal for driving the display panel 600 is input through the FPC 672.Alternatively, the IC 673 may be mounted on the FPC 672 by a chip onfilm (COF) method or the like.

FIG. 17 also shows an enlarged view of part of the display portion 662.The conductive films 663 included in a plurality of display elements arearranged in a matrix in the display portion 662. The conductive film 663has a function of reflecting visible light and serves as a reflectiveelectrode of a liquid crystal element 640 described later.

As illustrated in FIG. 17, the conductive film 663 has an opening. Alight-emitting element 660 is positioned closer to the substrate 651than the conductive film 663 is. Light is emitted from thelight-emitting element 660 to the substrate 661 side through the openingin the conductive film 663.

<3-2. Cross-Sectional Structure Example>

FIG. 18 shows an example of cross sections of part of a region includingthe FPC 672, part of a region including the circuit 659, and part of aregion including the display portion 662 of the display panelillustrated in FIG. 17.

The display panel includes an insulating film 620 between the substrates651 and 661. The display panel also includes the light-emitting element660, a transistor 601, a transistor 605, a transistor 606, a coloringlayer 634, and the like between the substrate 651 and the insulatingfilm 620. Furthermore, the display panel includes the liquid crystalelement 640, a coloring layer 631, and the like between the insulatingfilm 620 and the substrate 661. The substrate 661 and the insulatingfilm 620 are bonded with an adhesive layer 641. The substrate 651 andthe insulating film 620 are bonded with an adhesive layer 642.

The transistor 606 is electrically connected to the liquid crystalelement 640 and the transistor 605 is electrically connected to thelight-emitting element 660. Since the transistors 605 and 606 are formedon a surface of the insulating film 620 which is on the substrate 651side, the transistors 605 and 606 can be formed through the sameprocess.

The substrate 661 is provided with the coloring layer 631, alight-blocking film 632, an insulating film 621, a conductive film 613serving as a common electrode of the liquid crystal element 640, analignment film 633 b, an insulating film 617, and the like. Theinsulating film 617 serves as a spacer for holding a cell gap of theliquid crystal element 640.

Insulating layers such as an insulating film 681, an insulating film682, an insulating film 683, an insulating film 684, and an insulatingfilm 685 are provided on the substrate 651 side of the insulating film620. Part of the insulating film 681 functions as a gate insulatinglayer of each transistor. The insulating films 682, 683, and 684 areprovided to cover each transistor. The insulating film 685 is providedto cover the insulating film 684. The insulating films 684 and 685 eachfunction as a planarization layer. Note that an example where the threeinsulating layers, the insulating films 682, 683, and 684, are providedto cover the transistors and the like is described here; however, oneembodiment of the present invention is not limited to this example, andfour or more insulating layers, a single insulating layer, or twoinsulating layers may be provided. The insulating film 684 functioningas a planarization layer is not necessarily provided when not needed.

The transistors 601, 605, and 606 each include a conductive film 654part of which functions as a gate, a conductive film 652 part of whichfunctions as a source or a drain, and a semiconductor film 653. Here, aplurality of layers obtained by processing the same conductive film areshown with the same hatching pattern.

The liquid crystal element 640 is a reflective liquid crystal element.The liquid crystal element 640 has a stacked structure of a conductivefilm 635, a liquid crystal layer 612, and the conductive film 613. Inaddition, the conductive film 663 which reflects visible light isprovided in contact with the surface of the conductive film 635 thatfaces the substrate 651. The conductive film 663 includes an opening655. The conductive films 635 and 613 contain a material transmittingvisible light. In addition, an alignment film 633 a is provided betweenthe liquid crystal layer 612 and the conductive film 635 and thealignment film 633 b is provided between the liquid crystal layer 612and the conductive film 613. A polarizing plate 656 is provided on anouter surface of the substrate 661.

In the liquid crystal element 640, the conductive film 663 has afunction of reflecting visible light and the conductive film 613 has afunction of transmitting visible light. Light entering from thesubstrate 661 side is polarized by the polarizing plate 656, passesthrough the conductive film 613 and the liquid crystal layer 612, and isreflected by the conductive film 663. Then, the light passes through theliquid crystal layer 612 and the conductive film 613 again and reachesthe polarizing plate 656. In this case, alignment of the liquid crystalis controlled with a voltage that is applied between the conductive film613 and the conductive films 663 and 635, and thus optical modulation oflight can be controlled. That is, the intensity of light emitted throughthe polarizing plate 656 can be controlled. Light excluding light in aparticular wavelength region is absorbed by the coloring layer 631, andthus, emitted light is red light, for example.

The light-emitting element 660 is a bottom-emission light-emittingelement. The light-emitting element 660 has a structure in which aconductive film 643, an EL layer 644, and a conductive film 645 b arestacked in this order from the insulating film 620 side. In addition, aconductive film 645 a is provided to cover the conductive film 645 b.The conductive film 645 b contains a material reflecting visible light,and the conductive films 643 and 645 a contain a material transmittingvisible light. Light is emitted from the light-emitting element 660 tothe substrate 661 side through the coloring layer 634, the insulatingfilm 620, the opening 655, the conductive film 613, and the like.

Here, as illustrated in FIG. 18, the conductive film 635 transmittingvisible light is preferably provided for the opening 655. Accordingly,the liquid crystal is aligned in a region overlapping with the opening655 as well as in the other regions, in which case an alignment defectof the liquid crystal is prevented from being generated in the boundaryportion of these regions and undesired light leakage can be suppressed.

As the polarizing plate 656 provided on an outer surface of thesubstrate 661, a linear polarizing plate or a circularly polarizingplate can be used. An example of a circularly polarizing plate is astack including a linear polarizing plate and a quarter-wave retardationplate. Such a structure can reduce reflection of external light. Thecell gap, alignment, drive voltage, and the like of the liquid crystalelement used as the liquid crystal element 640 are controlled dependingon the kind of the polarizing plate so that desirable contrast isobtained.

In addition, an insulating film 647 is provided in contact with part ofthe insulating film 646 covering an end portion of the conductive film643. The insulating film 647 has a function as a spacer for preventingthe insulating film 620 and the substrate 651 from getting closer morethan necessary. In the case where the EL layer 644 or the conductivefilm 645 a is formed using a blocking mask (metal mask), the insulatingfilm 647 may have a function of preventing the blocking mask from beingin contact with a surface on which the EL layer 644 or the conductivefilm 645 a is formed. Note that the insulating film 647 is notnecessarily provided when not needed.

One of a source and a drain of the transistor 605 is electricallyconnected to the conductive film 643 of the light-emitting element 660through a conductive film 648.

One of a source and a drain of the transistor 606 is electricallyconnected to the conductive film 663 through a connection portion 607.The conductive films 663 and 635 are in contact with and electricallyconnected to each other. Here, in the connection portion 607, theconductive layers provided on both surfaces of the insulating film 620are connected to each other through an opening in the insulating film620.

A connection portion 604 is provided in a region of the substrate 651that does not overlap with the substrate 661. The connection portion 604is electrically connected to the FPC 672 through a connection layer 649.The connection portion 604 has a structure similar to that of theconnection portion 607. On the top surface of the connection portion604, a conductive layer obtained by processing the same conductive filmas the conductive film 635 is exposed. Thus, the connection portion 604and the FPC 672 can be electrically connected to each other through theconnection layer 649.

A connection portion 687 is provided in part of a region where theadhesive layer 641 is provided. In the connection portion 687, theconductive layer obtained by processing the same conductive film as theconductive film 635 is electrically connected to part of the conductivefilm 613 with a connector 686. Accordingly, a signal or a potentialinput from the FPC 672 connected to the substrate 651 side can besupplied to the conductive film 613 formed on the substrate 661 sidethrough the connection portion 687.

As the connector 686, a conductive particle can be used, for example. Asthe conductive particle, a particle of an organic resin, silica, or thelike coated with a metal material can be used. It is preferable to usenickel or gold as the metal material because contact resistance can bereduced. It is also preferable to use a particle coated with layers oftwo or more kinds of metal materials, such as a particle coated withnickel and further with gold. As the connector 686, a material capableof elastic deformation or plastic deformation is preferably used. Asillustrated in FIG. 18, the connector 686 which is the conductiveparticle has a shape that is vertically crushed in some cases. With thecrushed shape, the contact area between the connector 686 and aconductive layer electrically connected to the connector 686 can beincreased, thereby reducing contact resistance and suppressing thegeneration of problems such as disconnection.

The connector 686 is preferably provided so as to be covered with theadhesive layer 641. For example, the connectors 686 are dispersed in theadhesive layer 641 before curing of the adhesive layer 641.

FIG. 18 illustrates an example of the circuit 659 in which thetransistor 601 is provided.

The structure in which the semiconductor film 653 where a channel isformed is provided between two gates is used as an example of thetransistors 601 and 605 in FIG. 18. One gate is formed using theconductive film 654 and the other gate is formed using a conductive film623 overlapping with the semiconductor film 653 with the insulating film682 provided therebetween. Such a structure enables control of thresholdvoltages of a transistor. In that case, the two gates may be connectedto each other and supplied with the same signal to operate thetransistor. Such a transistor can have higher field-effect mobility andthus have higher on-state current than other transistors. Consequently,a circuit capable of high-speed operation can be obtained. Furthermore,the area occupied by a circuit portion can be reduced. The use of thetransistor having high on-state current can reduce signal delay inwirings and can reduce display unevenness even in a display panel inwhich the number of wirings is increased because of increase in size orresolution.

Note that the transistor included in the circuit 659 and the transistorincluded in the display portion 662 may have the same structure. Aplurality of transistors included in the circuit 659 may have the samestructure or different structures. A plurality of transistors includedin the display portion 662 may have the same structure or differentstructures.

A material through which impurities such as water and hydrogen do noteasily diffuse is preferably used for at least one of the insulatingfilms 682 and 683 which cover the transistors. That is, the insulatingfilm 682 or the insulating film 683 can function as a barrier film. Sucha structure can effectively suppress diffusion of the impurities intothe transistors from the outside, and a highly reliable display panelcan be provided.

The insulating film 621 is provided on the substrate 661 side to coverthe coloring layer 631 and the light-blocking film 632. The insulatingfilm 621 may have a function as a planarization layer. The insulatingfilm 621 enables the conductive film 613 to have an almost flat surface,resulting in a uniform alignment state of the liquid crystal layer 612.

An example of the method for manufacturing the display panel 600 isdescribed. For example, the conductive film 635, the conductive film663, and the insulating film 620 are formed in order over a supportsubstrate provided with a separation layer, and the transistor 605, thetransistor 606, the light-emitting element 660, and the like are formed.Then, the substrate 651 and the support substrate are bonded with theadhesive layer 642. After that, separation is performed at the interfacebetween the separation layer and each of the insulating film 620 and theconductive film 635, whereby the support substrate and the separationlayer are removed. Separately, the coloring layer 631, thelight-blocking film 632, the conductive film 613, and the like areformed over the substrate 661 in advance. Then, the liquid crystal isdropped onto the substrate 651 or 661 and the substrates 651 and 661 arebonded with the adhesive layer 641, whereby the display panel 600 can bemanufactured.

A material for the separation layer can be selected such that separationat the interface with the insulating film 620 and the conductive film635 occurs. In particular, it is preferable that a stacked layer of alayer including a high-melting-point metal material, such as tungsten,and a layer including an oxide of the metal material be used as theseparation layer, and a stacked layer of a plurality of layers, such asa silicon nitride layer, a silicon oxynitride layer, and a siliconnitride oxide layer be used as the insulating film 620 over theseparation layer. The use of the high-melting-point metal material forthe separation layer can increase the formation temperature of a layerformed in a later step, which reduces impurity concentration andachieves a highly reliable display panel.

As the conductive film 635, an oxide or a nitride such as a metal oxideor a metal nitride is preferably used. In the case of using a metaloxide, a material in which at least one of the concentrations ofhydrogen, boron, phosphorus, nitrogen, and other impurities and thenumber of oxygen vacancies is made to be higher than those in asemiconductor layer of a transistor is used for the conductive film 635.

<3-3. Components>

The above components will be described below.

[Adhesive Layer]

As the adhesive layer, a variety of curable adhesives such as a reactivecurable adhesive, a thermosetting adhesive, an anaerobic adhesive, and aphotocurable adhesive such as an ultraviolet curable adhesive can beused. Examples of these adhesives include an epoxy resin, an acrylicresin, a silicone resin, a phenol resin, a polyimide resin, an imideresin, a polyvinyl chloride (PVC) resin, a polyvinyl butyral (PVB)resin, and an ethylene vinyl acetate (EVA) resin. In particular, amaterial with low moisture permeability, such as an epoxy resin, ispreferred. Alternatively, a two-component-mixture-type resin may beused. Further alternatively, an adhesive sheet or the like may be used.

Furthermore, the resin may include a drying agent. For example, asubstance that adsorbs moisture by chemical adsorption, such as an oxideof an alkaline earth metal (e.g., calcium oxide or barium oxide), can beused. Alternatively, a substance that adsorbs moisture by physicaladsorption, such as zeolite or silica gel, may be used. The drying agentis preferably included because it can prevent impurities such asmoisture from entering the element, thereby improving the reliability ofthe display panel.

In addition, it is preferable to mix a filler with a high refractiveindex or light-scattering member into the resin, in which case lightextraction efficiency can be enhanced. For example, titanium oxide,barium oxide, zeolite, zirconium, or the like can be used.

[Connection Layer]

As the connection layer, an anisotropic conductive film (ACF), ananisotropic conductive paste (ACP), or the like can be used.

[Coloring Layer]

Examples of a material that can be used for the coloring layers includea metal material, a resin material, and a resin material containing apigment or dye.

[Light-Blocking Layer]

Examples of a material that can be used for the light-blocking layerinclude carbon black, titanium black, a metal, a metal oxide, and acomposite oxide containing a solid solution of a plurality of metaloxides. The light-blocking layer may be a film containing a resinmaterial or a thin film of an inorganic material such as a metal.Stacked films containing the material of the coloring layer can also beused for the light-blocking layer. For example, a stacked-layerstructure of a film containing a material of a coloring layer whichtransmits light of a certain color and a film containing a material of acoloring layer which transmits light of another color can be employed.It is preferable that the coloring layer and the light-blocking layer beformed using the same material because the same manufacturing apparatuscan be used and the process can be simplified.

The above is the description of the components.

<3-4. Manufacturing Method Example>

A manufacturing method example of a display panel using a flexiblesubstrate is described.

Here, layers including a display element, a circuit, a wiring, anelectrode, optical members such as a coloring layer and a light-blockinglayer, an insulating layer, and the like, are collectively referred toas an element layer. The element layer includes, for example, a displayelement, and may additionally include a wiring electrically connected tothe display element or an element such as a transistor used in a pixelor a circuit.

In addition, here, a flexible member which supports the element layer ata stage at which the display element is completed (the manufacturingprocess is finished) is referred to as a substrate. For example, asubstrate includes an extremely thin film with a thickness greater thanor equal to 10 nm and less than or equal to 300 μm and the like.

As a method for forming an element layer over a flexible substrateprovided with an insulating surface, typically, there are two methodsshown below. One of them is to directly form an element layer over thesubstrate. The other method is to form an element layer over a supportsubstrate that is different from the substrate and then to separate theelement layer from the support substrate to be transferred to thesubstrate. Although not described in detail here, in addition to theabove two methods, there is a method in which an element layer is formedover a substrate which does not have flexibility and the substrate isthinned by polishing or the like to have flexibility.

In the case where a material of the substrate can withstand heatingtemperature in a process for forming the element layer, it is preferablethat the element layer be formed directly over the substrate, in whichcase a manufacturing process can be simplified. At this time, theelement layer is preferably formed in a state where the substrate isfixed to the support substrate, in which case transfer thereof in anapparatus and between apparatuses can be easy.

In the case of employing the method in which the element layer is formedover the support substrate and then transferred to the substrate, first,a separation layer and an insulating layer are stacked over the supportsubstrate, and then the element layer is formed over the insulatinglayer. Next, the element layer is separated from the support substrateand then transferred to the substrate. At this time, selected is amaterial with which separation at an interface between the supportsubstrate and the separation layer, at an interface between theseparation layer and the insulating layer, or in the separation layeroccurs. With the method, it is preferable that a material having highheat resistance be used for the support substrate or the separationlayer, in which case the upper limit of the temperature applied when theelement layer is formed can be increased, and an element layer includinga more highly reliable element can be formed.

For example, it is preferable that a stack of a layer containing ahigh-melting-point metal material, such as tungsten, and a layercontaining an oxide of the metal material be used as the separationlayer, and a stack of a plurality of layers, such as a silicon oxidelayer, a silicon nitride layer, a silicon oxynitride layer, and asilicon nitride oxide layer be used as the insulating layer over theseparation layer.

As the method for separating the support substrate from the elementlayer, applying mechanical force, etching the separation layer, andmaking a liquid permeate the separation interface are given as examples.Alternatively, separation may be performed by heating or cooling twolayers of the separation interface by utilizing a difference in thermalexpansion coefficient.

The separation layer is not necessarily provided in the case where theseparation can be performed at an interface between the supportsubstrate and the insulating layer.

For example, glass and an organic resin such as polyimide can be used asthe support substrate and the insulating layer, respectively. In thatcase, a separation trigger may be formed by, for example, locallyheating part of the organic resin with laser light or the like, or byphysically cutting part of or making a hole through the organic resinwith a sharp tool, and separation may be performed at an interfacebetween the glass and the organic resin. As the above-described organicresin, a photosensitive material is preferably used because an openingor the like can be easily formed. The above-described laser lightpreferably has a wavelength region, for example, from visible light toultraviolet light. For example, light having a wavelength of greaterthan or equal to 200 nm and less than or equal to 400 nm, preferablygreater than or equal to 250 nm and less than or equal to 350 nm can beused. In particular, an excimer laser having a wavelength of 308 nm ispreferably used because the productivity is increased. Alternatively, asolid-state UV laser (also referred to as a semiconductor UV laser),such as a UV laser having a wavelength of 355 nm which is the thirdharmonic of an Nd:YAG laser, may be used.

Alternatively, a heat generation layer may be provided between thesupport substrate and the insulating layer formed of an organic resin,and separation may be performed at an interface between the heatgeneration layer and the insulating layer by heating the heat generationlayer. For the heat generation layer, any of a variety of materials suchas a material which generates heat by feeding current, a material whichgenerates heat by absorbing light, and a material which generates heatby applying a magnetic field can be used. For example, for the heatgeneration layer, a material selected from a semiconductor, a metal, andan insulator can be used.

In the above-described methods, the insulating layer formed of anorganic resin can be used as a substrate after the separation.

The above is the description of a manufacturing method of a flexibledisplay panel.

Note that the structure and the method described in this embodiment canbe used in appropriate combination with any of the structures and themethods described in the other embodiments.

EXPLANATION OF REFERENCE

P1: region, P2: region, P3: region, P4: region, P5: region, P6: region,P7: region, P8: region, 001: region, 002: region, 100: transistor, 100A:transistor, 100B: transistor, 100C: transistor, 100D: transistor, 102:substrate, 104: insulating film, 106: conductive film, 108: metal oxide,108_1: metal oxide, 1082: metal oxide, 1083: metal oxide, 112 a:conductive film, 112 b: conductive film, 112 c: conductive film, 114:insulating film, 116: insulating film, 118: insulating film, 120 a:conductive film, 120 a_2: conductive film, 120 b: conductive film, 120 b2: conductive film, 151: opening, 152 a: opening, 152 b: opening, 200A:transistor, 200B: transistor, 200C: transistor, 200D: transistor, 202:substrate, 204: insulating film, 206: conductive film, 208: metal oxide,208_1 a: metal oxide, 208_2 a: metal oxide, 208_3 a: metal oxide, 208 i:region, 208 i_1: region, 208 i_2: region, 208 i_3: region, 208 n:region, 210: insulating film, 210_0: insulating film, 212: conductivefilm, 212_0: conductive film, 216: insulating film, 218: insulatingfilm, 220 a:

conductive film, 220 b: conductive film, 240: mask, 241 a: opening, 241b: opening, 243: opening, 600: display panel, 601: transistor, 604:connection portion, 605: transistor, 606: transistor, 607: connectionportion, 612: liquid crystal layer, 613: conductive film, 617:insulating film, 620: insulating film, 621: insulating film, 623:conductive film, 631: coloring layer, 632: light-blocking film, 633 a:alignment film, 633 b: alignment film, 634: coloring layer, 635:

conductive film, 640: liquid crystal element, 641: adhesive layer, 642:adhesive layer, 643: conductive film, 644: EL layer, 645 a: conductivefilm, 645 b: conductive film, 646: insulating film, 647: insulatingfilm, 648: conductive film, 649: connection layer, 651: substrate, 652:conductive film, 653: semiconductor film, 654: conductive film, 655:opening, 656: polarizing plate, 659: circuit, 660: light-emittingelement, 661: substrate, 662: display portion, 663: conductive film,666: wiring, 672: FPC, 673: IC, 681: insulating film, 682: insulatingfilm, 683: insulating film, 684: insulating film, 685: insulating film,686: connector, 687: connection portion.

This application is based on Japanese Patent Application serial no.2016-137193 filed with Japan Patent Office on Jul. 11, 2016, the entirecontents of which are hereby incorporated by reference.

1. A semiconductor device comprising: a metal oxide comprising a channelformation region, a pair of electrodes in contact with the metal oxide,an insulator in contact with the metal oxide, and a gate electrodeoverlapping with the channel formation region with the insulatortherebetween, wherein the metal oxide is a composite material whichcomprises: a plurality of first regions formed of a first material; anda second region formed of a second material, wherein the first materialand the second material each comprise In, Zn and O, wherein the firstmaterial comprises Ga, wherein a concentration of In in the secondmaterial is higher than a concentration of In in the first material,wherein the first regions are irregularly dispersed in the secondregion, wherein each of the plurality of first regions has a size ofgreater than or equal to 0.5 nm and less than or equal to 2 nm, whereinan energy level of a conduction band minimum of the second material islower than an energy level of the conduction band minimum of the firstmaterial by 0.2 eV or more, wherein an energy gap of first material isgreater than or equal to 3.3 eV and less than or equal to 4.0 eV, andwherein an energy gap of the second material is greater than or equal to2.2 eV and less than or equal to 2.9 eV.
 2. The semiconductor deviceaccording to claim 1, wherein a carrier concentration in the secondregion is higher than a carrier concentration in the first regions. 3.The semiconductor device according to claim 1, wherein the metal oxideis a single layer.
 4. The semiconductor device according to claim 1,wherein each of the plurality of the first regions comprises a crystalwith a size greater than or equal to 1 nm and less than or equal to 2nm, and wherein a crystal orientation of a plurality of the crystals isirregular. 5.-7. (canceled)
 8. The semiconductor device according toclaim 1, wherein the second region comprises crystals with a sizegreater than or equal to 1 nm and less than or equal to 2 nm.
 9. Thesemiconductor device according to claim 1, wherein the second regioncomprises a region where second material is amorphous.
 10. A displaydevice comprising: a display portion comprising a pixel, wherein thepixel comprises the semiconductor device according to claim
 1. 11. Adisplay device comprising: a display portion and a gate driver, whereinthe gate driver comprises the semiconductor device according to claim 1.